Inventor profile of:

Amir Widmann

City:

Sunnyvale, California

Country:

United States

Published Applications:

13

Last publication date:

2017-09-07

Top Assignees for applications by Amir Widmann

The entities that hold a legal rights for patent applications filed by inventor Widmann Amir:

Recent patent applications by Widmann Amir

Amir Widmann from Sunnyvale, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2017-09-07
US20170255188A1
Physics

Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers

#2 | 2014-07-17
US20140199791A1
Electricity

Method and system for universal target based inspection and metrology

#3 | 2014-02-06
US20140037187A1
Physics

Inspecting a wafer and/or predicting one or more characteristics of a device being formed on a wafer

#4 | 2012-08-16
US20120208301A1
Physics

Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers

#5 | 2012-04-19
US20120094400A1
Physics

Feedforward/feedback litho process control of stress and overlay

#6 | 2012-01-26
US20120022679A1
Physics

Advanced process control optimization

#7 | 2011-03-03
US20110051150A1
Physics

Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capability

#8 | 2009-07-14
US11552918
-

Techniques for determining overlay and critical dimension using a single metrology tool

#9 | 2008-12-25
US20080316442A1
Physics

Feedforward/feedback litho process control of stress and overlay

#10 | 2008-11-20
US20080286885A1
Physics

Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers

#11 | 2008-04-24
US20080094639A1
Physics

Waferless recipe optimization

#12 | 2008-03-27
US20080073589A1
Physics

Method and system for optimizing alignment performance in a fleet of exposure tools

#13 | 2007-11-29
US20070276634A1
Physics

Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout

InventorID:

639923 ⎘