Santa Clara, California
United States
33
2025-05-08
The entities that hold a legal rights for patent applications filed by inventor Wang David Y.:
David Y. Wang from Santa Clara, US has applied for patents for these inventions. The list has both pending applications and granted patents:
TRANSISTOR CHANNEL STRESS AND MOBILITY METROLOGY USING MULTIPASS SPECTROSCOPIC ELLIPSOMETRY AND RAMAN JOINT MEASUREMENT
#2 | 2024-12-19Optics For Measurement Of Thick Films And High Aspect Ratio Structures
#3 | 2024-10-24Combined Spectroscopic Reflectometry And Pattern Recognition Based Measurements Of Semiconductor Structures
#4 | 2024-08-22ANGLE RESOLVED REFLECTOMETRY FOR THICK FILMS AND HIGH ASPECT RATIO STRUCTURES
#5 | 2023-10-26MEASUREMENT OF THICK FILMS AND HIGH ASPECT RATIO STRUCTURES
#6 | 2023-04-27Monolithic optical retarder
#7 | 2022-06-23Methods and systems for compact, small spot size soft x-ray scatterometry
#8 | 2022-05-05Reflective compact lens for magneto-optic Kerr effect metrology system
#9 | 2022-01-25Multi-environment polarized infrared reflectometer for semiconductor metrology
#10 | 2021-07-22Optical metrology tool equipped with modulated illumination sources
#11 | 2020-09-24Magneto-optic Kerr effect metrology systems
#12 | 2020-09-10Methods and systems for measurement of thick films and high aspect ratio structures
#13 | 2020-07-30Methods and systems for co-located metrology
#14 | 2020-07-30Mid-infrared spectroscopy for measurement of high aspect ratio structures
#15 | 2020-07-16Semiconductor metrology based on hyperspectral imaging
#16 | 2019-06-27Optical metrology tool equipped with modulated illumination sources
#17 | 2018-08-23Methods and systems for measurement of thick films and high aspect ratio structures
#18 | 2018-03-29Infrared spectroscopic reflectometer for measurement of high aspect ratio structures
#19 | 2017-12-14Simultaneous multi-angle spectroscopy
#20 | 2017-07-20Systems and methods for extended infrared spectroscopic ellipsometry
#21 | 2017-02-23Broadband and wide field angle compensator
#22 | 2017-01-19Optical metrology tool equipped with modulated illumination sources
#23 | 2016-08-25Optical metrology with reduced focus error sensitivity
#24 | 2015-10-08Multiple angles of incidence semiconductor metrology systems and methods
#25 | 2015-02-26Broadband and wide field angle compensator
#26 | 2014-12-25Multiple angles of incidence semiconductor metrology systems and methods
#27 | 2014-10-14Metrology systems and methods for high aspect ratio and large lateral dimension structures
#28 | 2014-02-04Angle-resolved spectroscopic instrument
#29 | 2013-07-04Optical metrology tool equipped with modulated illumination sources
#30 | 2013-05-09Dynamically adjustable semiconductor metrology system
#31 | 2013-02-07Light source tracking in optical metrology system
#32 | 2011-12-22Discrete polarization scatterometry
#33 | 2010-12-30System and method for performing photothermal measurements and relaxation compensation
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