Aseret
Israel
59
2025-01-30
The entities that hold a legal rights for patent applications filed by inventor Kandel Daniel:
Daniel Kandel from Aseret, IL has applied for patents for these inventions. The list has both pending applications and granted patents:
METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS
#2 | 2023-02-16Method and System for Providing a Quality Metric for Improved Process Control
#3 | 2019-03-28Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology
#4 | 2019-03-12Achieving a small pattern placement error in metrology targets
#5 | 2019-01-03Device metrology targets and methods
#6 | 2018-11-27Compound objectives for imaging and scatterometry overlay
#7 | 2018-09-27Multi-layer overlay metrology target and complimentary overlay metrology measurement systems
#8 | 2018-04-19Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology
#9 | 2018-03-22Self-moiré target design principles for measuring unresolved device-like pitches
#10 | 2017-12-26Decreasing inaccuracy due to non-periodic effects on scatterometric signals
#11 | 2017-12-12Approach for model calibration used for focus and dose measurement
#12 | 2017-10-26Structured illumination for contrast enhancement in overlay metrology
#13 | 2017-05-25Self-moire target design principles for measuring unresolved device-like pitches
#14 | 2017-05-25Systems for providing illumination in optical metrology
#15 | 2017-01-26Metrology target design for tilted device designs
#16 | 2016-10-27Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology
#17 | 2016-10-06Feed forward of metrology data in a metrology system
#18 | 2016-09-15Device metrology targets and methods
#19 | 2016-09-01Metrology using overlay and yield critical patterns
#20 | 2016-07-28Symmetric target design in scatterometry overlay metrology
#21 | 2016-04-14Focus measurements using scatterometry metrology
#22 | 2016-01-07Structured illumination for contrast enhancement in overlay metrology
#23 | 2015-11-05Apodization for pupil imaging scatterometry
#24 | 2015-10-29Target element types for process parameter metrology
#25 | 2015-08-20Reducing algorithmic inaccuracy in scatterometry overlay metrology
#26 | 2015-08-06Reflection symmetric scatterometry overlay targets and methods
#27 | 2015-07-23Symmetric target design in scatterometry overlay metrology
#28 | 2015-07-16Near field metrology
#29 | 2015-06-25Angle-resolved antisymmetric scatterometry
#30 | 2015-04-30Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology
#31 | 2015-02-05Metrology systems and methods
#32 | 2014-12-09Flexible scatterometry metrology system and method
#33 | 2014-10-23On-device metrology
#34 | 2014-08-28Systems for providing illumination in optical metrology
#35 | 2014-05-29Apodization for pupil imaging scatterometry
#36 | 2014-05-22Method and system for providing a target design displaying high sensitivity to scanner focus change
#37 | 2014-04-24Phase characterization of targets
#38 | 2014-03-06Device correlated metrology (DCM) for OVL with embedded SEM structure overlay targets
#39 | 2013-12-26Device-like scatterometry overlay targets
#40 | 2013-09-05Metrology systems and methods
#41 | 2013-02-21Overlay metrology by pupil phase analysis
#42 | 2013-02-07Method and system for providing a quality metric for improved process control
#43 | 2012-08-16Structured illumination for contrast enhancement in overlay metrology
#44 | 2012-05-17Angle-resolved antisymmetric scatterometry
#45 | 2012-02-09Optics symmetrization for metrology
#46 | 2012-02-09Multi-layer overlay metrology target and complimentary overlay metrology measurement systems
#47 | 2012-01-26Advanced process control optimization
#48 | 2011-12-22Discrete polarization scatterometry
#49 | 2011-08-18Method and system for providing process tool correctables using an optimized sampling scheme with smart interpolation
#50 | 2011-03-24Metrology systems and methods
#51 | 2011-03-03Substrate matrix to decouple tool and process effects
#52 | 2010-07-08Scatterometry metrology target design optimization
#53 | 2009-11-12Target design and methods for scatterometry overlay determination
#54 | 2008-10-30Optical gain approach for enhancement of overlay and alignment systems performance
#55 | 2007-12-06Order selected overlay metrology
#56 | 2007-10-04Apparatus and methods for detecting overlay errors using scatterometry
#57 | 2007-05-03Methods and apparatus for designing and using micro-targets in overlay metrology
#58 | 2006-12-07Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals
#59 | 2005-09-08Continuously varying offset mark and methods of determining overlay
81370 ⎘