Los Altos, California
United States
34
2016-10-27
The entities that hold a legal rights for patent applications filed by inventor Wack Dan:
Dan Wack from Los Altos, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Apparatus for measuring overlay errors
#2 | 2013-11-28Methods and Systems for Determining a Critical Dimension and Overlay of a Specimen
#3 | 2013-02-14Methods and systems for determining a critical dimension and overlay of a specimen
#4 | 2012-11-08Systems and Methods for Determining One or More Characteristics of a Specimen Using Radiation in the Terahertz Range
#5 | 2010-11-04METHODS AND SYSTEMS FOR CONTROLLING VARIATION IN DIMENSIONS OF PATTERNED FEATURES ACROSS A WAFER
#6 | 2010-10-28Methods and systems for determining a critical dimension and overlay of a specimen
#7 | 2010-09-16SYSTEMS AND METHODS FOR DETERMINING ONE OR MORE CHARACTERISTICS OF A SPECIMEN USING RADIATION IN THE TERAHERTZ RANGE
#8 | 2010-07-06Methods and systems for determining a critical dimension and overlay of a specimen
#9 | 2010-04-15Apparatus and methods for detecting overlay errors using scatterometry
#10 | 2009-11-26Overlay marks and methods of manufacturing such marks
#11 | 2008-04-24Apparatus and methods for detecting overlay errors using scatterometry
#12 | 2008-03-25Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography
#13 | 2008-01-31Overlay marks, methods of overlay mark design and methods of overlay measurements
#14 | 2008-01-08Apparatus and methods for detecting overlay errors using scatterometry
#15 | 2007-11-27Apparatus and methods for detecting overlay errors using scatterometry
#16 | 2007-10-04Systems and methods for measuring one or more characteristics of patterned features on a specimen
#17 | 2007-03-27Methods and systems for determining a thin film characteristic and an electrical property of a specimen
#18 | 2007-02-20Overlay marks, methods of overlay mark design and methods of overlay measurements
#19 | 2006-11-21Methods and systems for determining a composition and a thickness of a specimen
#20 | 2006-10-31Methods and systems for determining an adhesion characteristic and a thickness of a specimen
#21 | 2006-09-14Overlay marks, methods of overlay mark design and methods of overlay measurements
#22 | 2006-09-12Methods and systems for determining a presence of defects and a thin film characteristic of a specimen
#23 | 2006-08-10Overlay marks, methods of overlay mark design and methods of overlay measurements
#24 | 2006-06-29Methods and systems for controlling variation in dimensions of patterned features across a wafer
#25 | 2006-06-27Overlay marks, methods of overlay mark design and methods of overlay measurements
#26 | 2006-04-06Methods and systems for determining a presence of macro and micro defects on a specimen
#27 | 2006-02-28Methods and systems for determining overlay and flatness of a specimen
#28 | 2005-09-27Methods and systems for determining a thickness of a structure on a specimen and at least one additional property of the specimen
#29 | 2005-09-20Methods and systems for determining a characteristic of a layer formed on a specimen by a deposition process
#30 | 2005-07-19Methods and systems for determining a critical dimension, a presence of defects, and a thin film characteristic of a specimen
#31 | 2005-07-12Methods and systems for determining a property of a specimen prior to, during, or subsequent to an etch process
#32 | 2005-07-12Methods and systems for determining flatness, a presence of defects, and a thin film characteristic of a specimen
#33 | 2005-05-10Methods and systems for determining a critical dimension and overlay of a specimen
#34 | 2005-05-10Methods and systems for determining an implant characteristic and a presence of defects on a specimen
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