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Inventor profile of:

Kurt E. WAMPLER

City:

Sunnyvale, California

Country:

United States

Published Applications:

Last publication date:

2019-09-26

Top Assignees for applications by Kurt E. WAMPLER

The entities that hold a legal rights for patent applications filed by inventor WAMPLER Kurt E.:

ASML MaskTools B.V. 13 Veldhoven, Netherlands
ASML MaskTools B.V. 4 AH Veldhoven, Netherlands
ASML Masktools B.V. 2 , Netherlands
ASML Netherlands B.V. 2 Veldhoven, Netherlands
ASML MASKTOOLS B. V. 1 Veldhoven, Netherlands
ASML Masktools B. V. 1 Ah Veldhoven, Netherlands

Recent patent applications by WAMPLER Kurt E.

Kurt E. WAMPLER from Sunnyvale, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2019-09-26

US20190294053A1

Physics

Rule-based deployment of assist features

#2 | 2017-11-16

US20170329235A1

Physics

Rule-based deployment of assist features

#3 | 2011-06-16

US20110143268A1

Physics

Scattering bar OPC application method for sub-half wavelength lithography patterning

#4 | 2010-07-01

US20100167183A1

Physics

Method and apparatus for performing model-based layout conversion for use with dipole illumination

#5 | 2009-09-17

US20090233186A1

Physics

Scattering bar OPC application method for sub-half wavelength lithography patterning

#6 | 2008-08-28

US20080206656A1

Physics

Scattering bar OPC application method for sub-half wavelength lithography patterning

#7 | 2008-03-20

US20080067143A1

Physics

CPL mask and a method and program product for generating the same

#8 | 2007-07-24

US10756830

Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography

#9 | 2007-07-12

US20070162889A1

Physics

Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography

#10 | 2007-05-24

US20070117030A1

Physics

Method of two dimensional feature model calibration and optimization

#11 | 2007-02-22

US20070042277A1

Physics

Method and apparatus for performing model-based layout conversion for use with dipole illumination

#12 | 2007-02-13

US10266922

Method of two dimensional feature model calibration and optimization

#13 | 2006-11-21

US10705231

Method and apparatus for performing model-based layout conversion for use with dipole illumination

#14 | 2006-04-13

US20060080633A1

Physics

Method for performing full-chip manufacturing reliability checking and correction

#15 | 2005-06-30

US20050142449A1

Physics

Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography

#16 | 2005-06-09

US20050125765A1

Physics

Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography

#17 | 2005-04-07

US20050074677A1

Physics

Scattering bar OPC application method for sub-half wavelength lithography patterning

#18 | 2005-03-10

US20050053848A1

Physics

Method, program product and apparatus for generating assist features utilizing an image field map

#19 | 2005-02-01

US10395903

Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography

InventorID:

2039786 ⎘