🔗 Permalink

Inventor profile of:

Robert John SOCHA

City:

Campbell, California

Country:

United States

Published Applications:

Last publication date:

2024-06-06

Top Assignees for applications by Robert John SOCHA

The entities that hold a legal rights for patent applications filed by inventor SOCHA Robert John:

ASML Netherlands B.V. 20 Veldhoven, Netherlands
ASML MaskTools B.V. 2 Veldhoven, Netherlands
ASML Masktools B.V. 1 , Netherlands
ASML Holding N.V. 1 A.H. Veldhoven, Netherlands
ASML MaskTools B.V. 1 AH Veldhoven, Netherlands
ASML Holding N.V. 1 Veldhoven, Netherlands

Recent patent applications by SOCHA Robert John

Robert John SOCHA from Campbell, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-06-06

US20240184221A1

Physics

ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES

#2 | 2022-11-03

US20220350268A1

Physics

METROLOGY MARK STRUCTURE AND METHOD OF DETERMINING METROLOGY MARK STRUCTURE

#3 | 2021-11-04

US20210341846A1

Physics

Measurement apparatus and a method for determining a substrate grid

#4 | 2019-08-01

US20190235391A1

Physics

Measurement apparatus and a method for determining a substrate grid

#5 | 2018-12-20

US20180364588A1

Physics

Metrology by reconstruction

#6 | 2018-09-13

US20180259857A1

Physics

Coloring aware optimization

#7 | 2018-02-15

US20180046091A1

Physics

Inspection Apparatus, Inspection Method, Lithographic Apparatus, Patterning Device and Manufacturing Method

#8 | 2017-06-22

US20170177760A1

Physics

Optical metrology of lithographic processes using asymmetric sub-resolution features to enhance measurement

#9 | 2016-12-15

US20160363871A1

Physics

Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing method

#10 | 2015-06-25

US20150177166A1

Physics

Inspection method and apparatus, lithographic system and device manufacturing method

#11 | 2014-04-10

US20140101625A1

Physics

Rule optimization in lithographic imaging based on correlation of functions representing mask and predefined optical conditions

#12 | 2013-01-15

US12830258

Determining the gradient and hessian of the image log slope for design rule optimization for accelerating source mask optimization (SMO)

#13 | 2012-03-29

US20120077114A1

Physics

Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process

#14 | 2011-09-08

US20110219342A1

Physics

Rule optimization in lithographic imaging based on correlation of functions representing mask and predefined optical conditions

#15 | 2010-04-08

US20100086203A1

Physics

Method, program product, and apparatus for performing a model based coloring process for pattern decomposition for use in a multiple exposure process

#16 | 2010-01-28

US20100021055A1

Physics

Method, program product and apparatus for performing a model based coloring process for geometry decomposition for use in a multiple exposure process

#17 | 2009-09-22

US10756829

Method of optical proximity correction design for contact hole mask

#18 | 2009-06-11

US20090148783A1

Physics

Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process

#19 | 2009-05-14

US20090125866A1

Physics

Method for performing pattern decomposition for a full chip design

#20 | 2007-11-29

US20070273853A1

Physics

Lithographic apparatus and device manufacturing method

#21 | 2007-07-05

US20070157154A1

Physics

Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process

#22 | 2007-01-18

US20070013888A1

Physics

Variable illumination source

#23 | 2005-06-30

US20050142470A1

Physics

Feature optimization using interference mapping lithography

#24 | 2005-05-03

US9905198

Assist features for use in lithographic projection

#25 | 2005-03-22

US10079829

Illumination optimization for specific mask patterns

InventorID:

721992 ⎘