ClassID:

84092

B81C2201/0142 - CPC Classification

Classification description:

Manufacture or treatment of microstructural devices or systems in or on a substrate; Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning; Processes for removing material; Etching; Controlling etch progression Processes for controlling etch progression not provided for in  - 

Recent Application in this class:
#1
20260043148
2026-02-12

CLEANING COMPOSITION WITH MOLYBDENUM ETCHING INHIBITOR

#2
20250026629
2025-01-23

MEMS Array Structures for Gyroscopes with High Resonant Frequencies

#3
20240208806
2024-06-27

SEMICONDUCTOR CHIP WITH EMBEDDED MICROFLUIDIC CHANNELS AND METHOD OF FABRICATING THE SAME

#4
20240174512
2024-05-30

MICRO ELECTRO MECHANICAL SYSTEM PROBE AND MANUFACTURING METHOD THEREOF

#5
20230399754
2023-12-14

CLEANING COMPOSITION WITH MOLYBDENUM ETCHING INHIBITOR

#6
20230072948
2023-03-09

Microfabrication of omni-view peripheral scanning system

#7
20210403320
2021-12-30

Method for manufacturing semiconductor substrate, method for manufacturing damascene wiring structure, semiconductor substrate, and damascene wiring structure

#8
20210002131
2021-01-07

Method for manufacturing micromechanical structures in a device wafer

#9
20200247666
2020-08-06

Structure forming method and device

#10
20200227241
2020-07-16

Processing method and plasma processing apparatus

#11
20200048080
2020-02-13

MEMS microphone and manufacturing method for making same

#12
20190198345
2019-06-27

Atomic layer etching using a combination of plasma and vapor treatments

#13
20190023563
2019-01-24

Method of production of semiconductor device having semiconductor layer and support substrate spaced apart by recess

#14
20180346326
2018-12-06

Method for manufacturing micromechanical structures in a device wafer

#15
20180290883
2018-10-11

Forming a microelectromechanical systems (MEMS) device using silicon-on-nothing and epitaxy

#16
20180240967
2018-08-23

METHOD OF FORMING AN ON-PITCH SELF-ALIGNED HARD MASK FOR CONTACT TO A TUNNEL JUNCTION USING ION BEAM ETCHING

#17
20180005906
2018-01-04

Device manufacturing method and device manufacturing apparatus

#18
20170256416
2017-09-07

Atomic layer etching of ALOusing a combination of plasma and vapor treatments

#19
20170073224
2017-03-16

MEMS-based method for manufacturing sensor

#20
20160054160
2016-02-25

Vacuum-cavity-insulated flow sensors

#21
20150372225
2015-12-24

Method of forming an on-pitch self-aligned hard mask for contact to a tunnel junction using ion beam etching

#22
20140315320
2014-10-23

Control over ammonium fluoride levels in oxide etchant

#23
20140174658
2014-06-26

Etching apparatus and methods

#24
20140099241
2014-04-10

Micropores and methods of making and using thereof

#25
20140069185
2014-03-13

Vacuum cavity-insulated flow sensors

#26
20120074598
2012-03-29

Chip, method for producing a chip and device for laser ablation

#27
20120057216
2012-03-08

MULTICOMPONENT SACRIFICIAL STRUCTURE

#28
20110028351
2011-02-03

Methods and devices for immobilization of single particles in a virtual channel in a hydrodynamic trap

#29
20110024368
2011-02-03

Micropores and methods of making and using thereof

#30
20090218312
2009-09-03

METHOD AND SYSTEM FOR XENON FLUORIDE ETCHING WITH ENHANCED EFFICIENCY

#31
20080245674
2008-10-09

SYSTEM AND METHOD FOR OBTAINING ANISOTROPIC ETCHING OF PATTERNED SUBSTRATES

#32
20080074564
2008-03-27

Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part

#33
20080057731
2008-03-06

Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part

#34
20080009139
2008-01-10

Structure in a substrate for the manufacturing of a semiconductor device and process for manufacturing of a semiconductor device

#35
20070291370
2007-12-20

Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part

#36
20070072428
2007-03-29

Method for manufacturing a micro-electro-mechanical structure

#37
20060264058
2006-11-23

Liquid-based gravity-driven etching-stop technique for controlling structure dimension

#38
20060209520
2006-09-21

Method of manufacturing a wiring board

#39
20060065622
2006-03-30

Method and system for xenon fluoride etching with enhanced efficiency

#40
20060040505
2006-02-23

Method for manufacturing a micro-electromechanical device and micro-electromechanical device obtained therewith

#41
20060027532
2006-02-09

Method for selectively removing material from the surface of a substrate, masking material for a wafer, and wafer with masking material

#42
20050112887
2005-05-26

Etching process