B81C2201/0135 - CPC Classification Index

ClassID:

84087 ⎘

B81C2201/0135 - CPC Classification

Classification description:

Manufacture or treatment of microstructural devices or systems in or on a substrate; Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning; Processes for removing material; Etching Controlling etch progression

Sub-classes:

B81C2201/0136 » by doping limited material regions 24
B81C2201/0138 » Monitoring physical parameters in the etching chamber, e.g. pressure, temperature or gas composition 25
B81C2201/0139 » with the electric potential of an electrochemical etching 9
B81C2201/014 » by depositing an etch stop layer, e.g. silicon nitride, silicon oxide, metal 188
B81C2201/0142 » Processes for controlling etch progression not provided for in to 41

Recent Application in this class:

20230061174

2023-03-02

CHARGE TRANSFER CIRCUITRY FOR MEMS DEVICES

20220259038

2022-08-18

HIGH-VOLUME MILLIMETER SCALE MANUFACTURING

20210370449

2021-12-02

Method of fabricating a microscale canopy wick structure having enhanced capillary pressure and permeability

20190333773

2019-10-31

Method of etching microelectronic mechanical system features in a silicon wafer

20190287810

2019-09-19

Method of etching microelectronic mechanical system features in a silicon wafer

20190256353

2019-08-22

High-volume millimeter scale manufacturing

20190198345

2019-06-27

Atomic layer etching using a combination of plasma and vapor treatments

20180093884

2018-04-05

Method of manufacturing MEMS switches with reduced switching voltage

20180065847

2018-03-08

Method of manufacturing MEMS switches with reduced switching voltage

#10

20170365507

2017-12-21

Field emission devices and methods of making thereof

#11

20170320724

2017-11-09

MEMS grid for manipulating structural parameters of MEMS devices

#12

20170256416

2017-09-07

Atomic layer etching of ALOusing a combination of plasma and vapor treatments

#13

20170088415

2017-03-30

MEMS grid for manipulating structural parameters of MEMS devices

#14

20170073218

2017-03-16

Mechanically isolated MEMS device

#15

20160346714

2016-12-01

Island etched filter passages

#16

20140174658

2014-06-26

Etching apparatus and methods

#17

20140028192

2014-01-30

Field emission devices and methods of making thereof

#18

20120032304

2012-02-09

Semiconductor device and manufacturing method thereof

#19

20090260961

2009-10-22

MEMS switches with reduced switching voltage and methods of manufacture

#20

20080254635

2008-10-16

Method for Accelerated Etching of Silicon

#21

20070093045

2007-04-26

Semiconductor device and manufacturing method thereof

#22

20060231521

2006-10-19

Technique for manufacturing micro-electro mechanical structures