176989 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Photosensitive materials; Diazonium salts or compounds; Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds Polyurethanes; Epoxy resins
WELDING METHOD FOR CREATING AN UPSCALED MASTER
#2NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LAMINATED FILM
#3ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
#4Resin composition and flow cells incorporating the same
#5Black photosensitive resin composition and black column spacer prepared therefrom
#6Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method
#7Optical information recording medium, optical information recording method and optical information reproducing method
#8Increased sensitivity, IR, and UV imageable photographic elements
#9Increased sensitivity, UV imageable photographic elements