206367 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Sources Electron sources
Sub-classes:Hybrid ion source for aluminum ion generation using organoaluminium compounds and a solid target
#2Method and Apparatus for Plasma Processing
#3APPARATUS AND METHOD FOR DEPOSITING HARD CARBON LAYERS
#4CHARGED PARTICLE SOURCE
#5Method of recording an image using a particle microscope
#6Height measuring device, charged particle beam apparatus, and height measuring method
#7Method and apparatus for examining a beam of charged particles
#8Integrated transmission electron microscope
#9Particle-optical apparatus and particle beam system
#10Charged particle source
#11Method and apparatus for plasma processing
#12Electron energy loss spectroscopy with adjustable energy resolution
#13Charged particle beam system and method
#14Electron-Beam Inspection Systems with optimized throughput
#15Charged particle source
#16Electron source for a free electron laser
#17Method for the in situ preparation of microscopic specimens
#18On-axis illumination and alignment for charge control during charged particle beam inspection
#19Generation and acceleration of charged particles using compact devices and systems
#20Particle-optical apparatus and particle beam system
#21Radiation Analyzing Apparatus
#22CONTINUOUSLY VARIABLE APERTURE
#23Method and apparatus for alignment of optical and charged-particle beams in an electron microscope
#24Charged particle beam device and control method of charged particle beam device
#25Low energy electron microscopy
#26Method and system for scanning an object
#27Multi-Stage/Multi-Chamber Electron-Beam Inspection System
#28Multi-stage/multi-chamber electron-beam inspection system
#29System for discharging an area that is scanned by an electron beam
#30Charged particle source
#31Charged particle source
#32Multi-beam dark field imaging
#33METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING THE SAME
#34Charge dynamics effect for detection of voltage contrast defect and determination of shorting location
#35Systems and methods for particle pulse modulation
#36System for discharging an area that is scanned by an electron beam
#37Device, manufacturing method, and exposure apparatus
#38APPLICATION OF ELECTRON-BEAM INDUCED PLASMA PROBES TO INSPECTION, TEST, DEBUG AND SURFACE MODIFICATIONS
#39Electron beam lithography process with multiple columns
#40Method and system for reducing charging artifacts in scanning electron microscopy images
#41Micro-electron column having an electron emitter improving the density of an electron beam emitted from a nano structure tip
#42Charged particle source arrangement for a charged particle beam device, charged particle beam device for sample inspection, and method for providing a primary charged particle beam for sample inspection in a charged particle beam
#43Ion pump and charged particle beam device using the same
#44Method and device for characterizing an electron beam
#45Generation and acceleration of charged particles using compact devices and systems
#46Swing objective lens
#47Method for S/TEM sample analysis
#48Charged particle source
#49Method for generating writing data
#50Certified wafer inspection
#51Electrostatic lens having a dielectric semiconducting membrane
#52Systems and methods for particle pulse modulation
#53Hybrid electron microscope
#54Apparatus and method for calculating drawing speeds of a charged particle beam
#55High-resolution amplitude contrast imaging
#56Individually switched field emission arrays
#57STAGE APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLES MANUFACTURING METHOD
#58Phase analyzer, phase analysis method, and surface analyzer
#59Method for soil treatment
#60Multi-beam particle microscope and method for operating same
#61Multi charged particle beam writing method, and multi charged particle beam writing apparatus
#62Apparatus and method of applying small-angle electron scattering to characterize nanostructures on opaque substrate
#63Multipole lens, aberration corrector, and electron microscope
#64Defect sampling for electron beam review based on defect attributes from optical inspection and optical review
#65Method of inspecting a semiconductor substrate
#66LITHOGRAPHY APPARATUS AND METHOD, AND METHOD OF MANUFACTURING AN ARTICLE
#67Method for detecting an electrical defect of contact/via plugs
#68Method for creating S/TEM sample and sample structure
#69TARGET DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
#70Charged particle beam drawing apparatus
#71Exposure method using control of settling times and methods of manufacturing integrated circuit devices by using the same
#72Electron beam writing apparatus, and method for adjusting convergence half angle of electron beam
#73Focusing a charged particle system
#74Raman microscope and electron microscope analytical system
#75Imaging a Sample with Multiple Beams and Multiple Detectors
#76Method for correcting drift of charged particle beam, and charged particle beam writing apparatus
#77Transmission electron microscope and method of displaying TEM images
#78Charged particle beam device and sample preparation method
#79Method for manufacturing electron source
#80Bulk deposition for tilted mill protection
#81Charged particle beam writing apparatus, and charged particle beam writing method
#82Method for acquiring settling time
#83Charged particle beam apparatus having improved needle movement control
#84Charged particle beam apparatus having needle probe that tracks target position changes
#85Endpoint detection for photolithography mask repair
#86Electron microscope and electron beam detector
#87Method for S/TEM sample analysis
#88MEMBER FOR CHARGED PARTICLE BEAM DEVICE, CHARGED PARTICLE BEAM DEVICE AND DIAPHRAGM MEMBER
#89Electron microscope and electron microscope sample retaining device
#90DRAWING APPARATUS, DRAWING METHOD AND MANUFACTURING METHOD OF ARTICLE
#91Charged particle beam apparatus
#92METHOD FOR MEASURING INCLINATION OF BEAM, DRAWING METHOD, DRAWING APPARATUS, AND METHOD OF MANUFACTURING OBJECT
#93Plasma source apparatus and methods for generating charged particle beams
#94PARTICLE BEAM SYSTEM AND METHOD FOR OPERATING THE SAME
#95Charged particle beam apparatus
#96Charged particle beam device
#97Charged particle beam device
#98Scanning electron microscope system capable of measuring in-cell overlay offset using high-energy electron beam and method thereof
#99INSPECTION APPARATUS
#100Adjustable cathodoluminescence detection system and microscope employing such a system
#101Charged particle beam apparatus
#102Scanning electron microscope
#103Scanning charged particle microscope, image acquisition method, and electron detection method
#104Electron beam data storage system and method for high volume manufacturing
#105Mass spectrometric ion storage device for different mass ranges
#106High brightness electron gun, system using the same, and method of operating thereof
#107Particle beam system and method for operating the same
#108Mass Spectrometric ion storage device for different mass ranges
#109Adjustable cathodoluminescence detection system and microscope employing such a system
#110Electron beam data storage system and method for high volume manufacturing
#111Method for creating S/TEM sample and sample structure
#112Electron beam column and methods of using same
#113Dual element switched electron gun
#114Method for S/TEM sample analysis
#115Method for creating S/TEM sample and sample structure
#116Method for creating S/tem sample and sample structure
#117Method and apparatus for producing large diameter superalloy ingots
#118Ion implantation ion source, system and method
#119Method and apparatus for producing large diameter superalloy ingots
#120Generation, acceleration, focusing and collection of a high-brightness, space-charge-dominated circular charged-particle beam
#121ION IMPLANTATION ION SOURCE, SYSTEM AND METHOD
#122Ion implantation ion source, system and method
#123Dual mode ion source for ion implantation
#124Data recording using carbon nanotube electron sources
#125Ion implantation ion source, system and method
#126Ion implantation ion source, system and method
#127Shaped sputter shields for improved ion column operation
#128Electron source devices, electron source assemblies, and methods for generating electrons
#129Array-based characterization tool
#130Alignment and registration targets for multiple-column charged particle beam lithography and inspection