206522 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Tubes for localised analysis using electron or ion beams characterised by their application Secondary particles mass or energy spectrometry
Sub-classes:TEMPORAL CHARACTERIZATION OF OSCILLATOR SIGNALS IN CHARGED PARTICLE MICROSCOPY
#2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry
#3Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry
#4Electronic state calculation method, electronic state calculation device, and recording medium
#5Background reduction system including louver
#6Charged particle analyser and method using electrostatic filter grids to filter charged particles
#7Determining dopant information
#8Focused ion beam system and a method of sample preparation and observation
#9Flood gun for charge neutralization
#10Standard sample for transmission electron microscope (TEM) elemental mapping and TEM elemetal mapping method using the same