206562 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion microscopes; Scanning microscopes characterised by the application; Measurement of surface topography Depth profile
Analysis System and Particle Analysis Method
#2Pattern Measurement Method, Measurement System, and Computer-Readable Medium
#3Pattern Measurement Device and Pattern Measurement Method
#4METHOD TO MORE PRECISELY CALIBRATE THE MECHANICAL TILT AND ROTATION ANGLES OF AN SEM COLUMN
#5FLOW FOR HIGH RESOLUTION STEREOSCOPIC MEASUREMENTS
#6PRECISION IN STEREOSCOPIC MEASUREMENTS USING A PRE-DEPOSITION LAYER
#7NON-DESTRUCTIVE SEM-BASED DEPTH-PROFILING OF SAMPLES
#8SYSTEMS AND METHODS FOR SIGNAL ELECTRON DETECTION IN AN INSPECTION APPARATUS
#9Lateral recess measurement in a semiconductor specimen
#10Pattern measurement device and pattern measurement method
#11Charged particle beam apparatus and setting assisting method
#12Pattern Measurement Method, Measurement System, and Computer-Readable Medium
#13Evaluating an intermediate product related to a three-dimensional NAND memory unit
#14High-resolution three-dimensional profiling of features in advanced semiconductor devices in a non-destructive manner using electron beam scanning electron microscopy
#15Pattern measurement device and pattern measurement method
#16Tomography-assisted TEM prep with requested intervention automation workflow
#17Method of performing tomographic imaging in a charged-particle microscope
#18Image analysis apparatus and charged particle beam apparatus
#19System and method for measuring patterns
#20Tomography-assisted TEM prep with requested intervention automation workflow
#21Cross sectional depth composition generation utilizing scanning electron microscopy
#22Cross sectional depth composition generation utilizing scanning electron microscopy
#23Charged particle beam device
#24Cross sectional depth composition generation utilizing scanning electron microscopy
#25Scanning electron microscope system, pattern measurement method using same, and scanning electron microscope
#26Method of performing tomographic imaging in a charged-particle microscope
#27Method for generating parameter pattern, ion implantation method and feed forward semiconductor manufacturing method
#28Sample observation device
#29Determining a state of a high aspect ratio hole using measurement results from an electrostatic measurement device
#30Three-dimensional semiconductor image reconstruction apparatus and method
#31Scanning electron microscope
#32Charged particle beam system and method of operating thereof
#33Defect inspection method and device therefor
#34Method and apparatus to measure step height of device using scanning electron microscope
#35Scanning electron microscope and sample observation method
#36Charged-particle microscope device and method for inspecting sample using same
#37Combination laser and charged particle beam system
#38Charged particle beam apparatus
#39Method and its system for calibrating measured data between different measuring tools
#40Charged particle beam apparatus
#41Contact opening metrology
#42Charged particle beam apparatus
#43Ion beam apparatus and analysis method
#44Contact opening metrology
#45Scanning electron microscope having multiple detectors and a method for multiple detector based imaging
#46Field emission electron gun and electron beam apparatus using the same
#47Charged particle beam apparatus
#48Contact opening metrology
#49Method for determining depression/protrusion of sample and charged particle beam apparatus therefor
#50Method of observing defects
#51Slice depth reconstruction of charged particle images using model simulation for improved generation of 3D sample images
#52Three-dimensional semiconductor image reconstruction apparatus and method