206563 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion microscopes; Scanning microscopes characterised by the application; Measurement of surface topography Length
Overlay structure and method of fabricating the same
#2Image analysis apparatus and charged particle beam apparatus
#3Multiple beam image acquisition apparatus and multiple beam image acquisition method
#4Charged particle beam apparatus, alignment method of charged particle beam apparatus, alignment program, and storage medium
#5Pattern analysis method of a semiconductor device
#6Method for estimating shape before shrink and CD-SEM apparatus
#7Inspection system by charged particle beam and method of manufacturing devices using the system
#8Pattern dimension measurement method and charged particle beam apparatus
#9Pattern determination device and computer program
#10Semiconductor inspection device and semiconductor inspection method using the same
#11Inspection system by charged particle beam and method of manufacturing devices using the system
#12Method for adjusting optical axis of charged particle radiation and charged particle radiation device
#13Scanning electron microscope
#14Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
#15Pattern measuring apparatus and pattern measuring method
#16Sample transfer unit and sample transferring method
#17Charged particle beam apparatus and dimension measuring method
#18Ultra high precision measurement tool
#19Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
#20Scanning electron microscope
#21Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
#22Inspection system by charged particle beam and method of manufacturing devices using the system
#23Method and its system for calibrating measured data between different measuring tools
#24Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
#25Sheet beam-type testing apparatus
#26Pattern measuring method and electron microscope
#27Sample transfer unit and sample transferring method
#28Standard component for length measurement, method for producing the same, and electron beam metrology system using the same
#29Electron beam apparatus and device production method using the electron beam apparatus
#30Method for inspecting substrate, substrate inspecting system and electron
#31Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the same
#32Method of determining micro- and nano- sizes in scanning electron microscope
#33Scanning electron microscope with measurement function
#34Charged particle beam apparatus and dimension measuring method
#35Standard component for calibration and calibration method using it and electro beam system
#36Conductive probe and method for producing the same
#37Electron-beam size measuring apparatus and size measuring method with electron beams
#38Measurement of critical dimension and quantification of electron beam size at real time using electron beam induced current
#39Inspection system by charged particle beam and method of manufacturing devices using the system
#40Electron microscope for inspecting dimension and shape of a pattern formed on a wafer
#41PATTERN INSPECTION AND MEASUREMENT APPARATUS
#42Line-width measurement adjusting method and scanning electron microscope
#43Electron beam apparatus and device production method using the electron beam apparatus
#44Inspection system by charged particle beam and method of manufacturing devices using the system
#45Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
#46Inspection system by charged particle beam and method of manufacturing devices using the system
#47System and method for determining a cross sectional feature of a structural element using a reference structural element
#48Method for inspecting substrate, substrate inspecting system and electron beam apparatus
#49Method and apparatus for scanning and measurement by electron beam
#50Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
#51Method and apparatus for arranging recipe of scanning electron microscope and apparatus for evaluating shape of semiconductor device pattern
#52Calibration method for electron-beam system and electron-beam system
#53Standard member for length measurement, method for producing the same, and electron beam length measuring device using the same
#54Scanning electron microscope with measurement function
#55Sheet beam-type testing apparatus
#56Charged particle beam apparatus and dimension measuring method
#57Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
#58Sub-diffraction limit resolution in microscopy
#59Sheet beam-type inspection apparatus
#60Shape measuring device and shape measuring method
#61Sample dimension-measuring method and charged particle beam apparatus
#62Nanoscale standard sample and its manufacturing method