206632 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale Etching microareas
Sub-classes:ION BEAM SOURCE APPARATUS, ION BEAM PROCESSING SYSTEM, AND ION BEAM PROCESSING METHOD
#2DETECTING AND ADJUSTING LAMELLA DEFORMATION
#3PATTERN SHAPING OF METAL RESIST LAYER USING REACTIVE ANGLED BEAM PROCESSING
#4ION BEAM REFLECTOR, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE SAME
#5MICROSCOPY IMAGING METHOD AND SYSTEM
#6Method and System for Plasma Process
#7Focused Ion Beam System
#8ION BEAM LITHOGRAPHY AND NANOENGINEERING
#9Fiducial guided cross-sectioning and lamella preparation with tomographic data collection
#10Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions
#11Modulation of rolling k vectors of angled gratings
#12Microscopy imaging method for 3D tomography with predictive drift tracking for multiple charged particle beams
#13Ion beam chamber fluid delivery apparatus and method and ion beam etcher using same
#14NON-CONTACT POLISHING OF A CRYSTALLINE LAYER OR SUBSTRATE BY ION BEAM ETCHING
#15CONTROLLING ETCH ANGLES BY SUBSTRATE ROTATION IN ANGLED ETCH TOOLS
#16ION BEAM ETCHING WITH GAS TREATMENT AND PULSING
#17Depositive shielding for fiducial protection from redeposition
#18Writing data generating method, multi charged particle beam writing apparatus, pattern inspecting apparatus, and computer-readable recording medium
#19Material recovery systems for optical components
#20Textured surfaces for breast implants
#21Controlling etch angles by substrate rotation in angled etch tools
#22METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
#23Methods and apparatus for processing a substrate
#24Method and system for iteratively cross-sectioning a sample to correlatively targeted sites
#25Methods and apparatus for processing a substrate
#26Method of material deposition
#27Multi-source ion beam etch system
#28Method and device for a carrier proximity mask
#29Forming a vertical surface
#30Modulation of rolling k vectors of angled gratings
#31METHOD AND APPARATUS FOR ANGLED ETCHING
#32Method of manufacturing emitter, emitter, and focused ion beam apparatus
#33Writing data generating method, multi charged particle beam writing apparatus, pattern inspecting apparatus, and computer-readable recording medium
#34Method of atomic layer etching of oxide
#35System and method to increase surface friction across a hydrophobic, anti-fouling, and oleophobic coated substrate
#36Modulation of ion beam angle
#37Modulation of rolling K vectors of angled gratings
#38Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions
#39Textured surfaces for breast implants
#40Method and system for cross-sectioning a sample with a preset thickness or to a target site
#41Textured surfaces for breast implants
#42Ion beam etching system
#43Method for processing an object
#44METHOD AND DEVICE FOR PROCESSING A SURFACE OF A SUBSTRATE BY MEANS OF A PARTICLE BEAM
#45Substrate processing apparatus
#46Method and apparatus for the planarization of surfaces
#47Method of atomic layer etching of oxide
#48Etching methods
#49Method for sample orientation for TEM lamella preparation
#50Methods and devices for examining an electrically charged specimen surface
#51Optical sensor, manufacturing method thereof, and fluid analysis method using the same
#52Method and apparatus for an imaging system
#53Method of material deposition
#54SUBSTRATE PROCESSING APPARATUS AND HEAT SHIELD PLATE
#55Low Electron Temperature Etch Chamber with Independent Control Over Plasma Density, Radical Composition Ion Energy for Atomic Precision Etching
#56Microscopy imaging method and system
#57Composite charged particle beam apparatus and control method thereof
#58Charged particle beam-induced etching
#59Ion beam apparatus generating ion beams of bilateral symmetry
#60Microscopy imaging method and system
#61Method of material deposition
#62Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching
#63Method and apparatus for an electromagnetic emission based imaging system
#64Grid, method of manufacturing the same, and ion beam processing apparatus
#65METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING THE SAME
#66Use of ion beam etching to generate gate-all-around structure
#67Methods and devices for examining an electrically charged specimen surface
#68Textured surfaces for breast implants
#69Fabrication and self-aligned local functionalization of nanocups and various plasmonic nanostructures on flexible substrates for implantable and sensing applications
#70DYNAMIC APERTURE FOR THREE-DIMENSIONAL CONTROL OF THIN-FILM DEPOSITION AND ION-BEAM EROSION
#71Two-dimensional materials and uses thereof
#72System for manufacturing semiconductor device
#73Fabrication and self-aligned local functionalization of nanocups and various plasmonic nanostructures on flexible substrates for implantable and sensing applications
#74Method of forming a pattern using ion beams of bilateral symmetry, a method of forming a magnetic memory device using the same, and an ion beam apparatus generating ion beams of bilateral symmetry
#75Use of ion beam etching to generate gate-all-around structure
#76Method for structuring an object with the aid of a particle beam apparatus
#77Semiconductor inspection system and methods of inspecting a semiconductor device using the same
#78Process gas enhancement for beam treatment of a substrate
#79Method and apparatus for a high resolution imaging system
#80GAS CLUSTER REACTOR FOR ANISOTROPIC FILM GROWTH
#81Gas cluster reactor for anisotropic film growth
#82High aspect ratio structure analysis
#83Alignment marking for rock sample analysis
#84Charged particle beam apparatus
#85Ion sources, systems and methods
#86Ion source, ion gun, and analysis instrument
#87Method for manufacturing semiconductor device and semiconductor device
#88Automated slice milling for viewing a feature
#89Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission
#90Method of reconstructing electrical probes
#91Ion sources, systems and methods
#92Low energy ion milling or deposition
#93Method for fabricating emitter
#94Method of fabricating nanotips with controlled profile
#95Method of processing a material-specimen
#96Composite charged particle beam apparatus and thin sample processing method
#97Gas cluster ion beam process for opening conformal layer in a high aspect ratio contact via
#98Low energy ion beam etch
#99Method of formation of coherent wavy nanostructures (variants)
#100Method and system for controlling critical dimension and roughness in resist features
#101Charged particle beam device, position specification method used for charged particle beam device, and program
#102Charged particle beam apparatus and film thickness measurement method
#103Apparatus for cooling samples during ion beam preparation
#104Ion sources, systems and methods
#105Apparatus and method for controlled particle beam manufacturing
#106Processing system
#107Gas field ion microscopes having multiple operation modes
#108METHOD AND APPARATUS FOR PRODUCING THREE DIMENSIONAL NANO AND MICRO SCALE STRUCTURES
#109Particle-Beam Induced Processing Using Liquid Reactants
#110Method of formation of coherent wavy nanostructures (variants)
#111Combination laser and charged particle beam system
#112Automated slice milling for viewing a feature
#113Apparatus and method for investigating and/or modifying a sample
#114USE OF HIGH ENERGY HEAVY ION BEAM FOR DIRECT SPUTTERING
#115Methods for performing circuit edit operations with low landing energy electron beams
#116Laser processing system, object mount and laser processing method
#117Apparatus and method for surface modification using charged particle beams
#118Method for treating non-planar structures using gas cluster ion beam processing
#119Method and system for tilting a substrate during gas cluster ion beam processing
#120Particle beam microscopy system and method for operating the same
#121MANUFACTURING METHOD OF ELECTRON SOURCE
#122High pressure charged particle beam system
#123Electron induced chemical etching and deposition for local circuit repair
#124Beam quality in FIB systems
#125System and method for backside circuit editing on full thickness silicon device
#126Methods and systems for removing a material from a sample
#127Charged particle beam application apparatus
#128Method and apparatus for manufacturing magnetic recording media
#129Dual beam apparatus with tilting sample stage
#130ICE LAYERS IN CHARGED PARTICLE SYSTEMS AND METHODS
#131APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
#132Reducing Line Edge Roughness by Particle Beam Exposure
#133Processing system
#134Method to create three-dimensional images of semiconductor structures using a focused ion beam device and a scanning electron microscope
#135PLASMA AND ELECTRON BEAM ETCHING DEVICE AND METHOD
#136Ion sources, systems and methods
#137Nanotube processing employing solid-condensed-gas-layers
#138Defect recognizing method, defect observing method, and charged particle beam apparatus
#139Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
#140METHODS AND APPARATUS FOR IN SITU SUBSTRATE TEMPERATURE MONITORING BY ELECTROMAGNETIC RADIATION EMISSION
#141High resolution plasma etch
#142Charged particle beam application apparatus
#143Working method by focused ion beam and focused ion beam working apparatus
#144Apparatus and method for surface modification using charged particle beams
#145Method and system for treating an interior surface of a workpiece using a charged particle beam
#146Method of manufacturing sample for atom probe analysis by FIB and focused ion beam apparatus implementing the same
#147CHARGED PARTICLE BEAM APPARATUS
#148Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
#149Method and apparatus for in-situ sample preparation
#150Achromatic mass separator
#151Emission detecting analysis system and method of detecting emission on object
#152Charged particle-beam processing using a cluster source
#153Gas field ION source for multiple applications
#154Method of formation of coherent wavy nanostructures (variants)
#155Planar etching of dissimilar materials
#156Method and device for ion beam processing of surfaces
#157Ion beam processing apparatus
#158Method and system for identifying events in FIB
#159Electron Beam Etching Apparatus and Method for the same
#160Plasma and electron beam etching device and method
#161Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
#162Electron induced chemical etching and deposition for local circuit repair
#163Apparatus and method for controlled particle beam manufacturing
#164Apparatus and method for controlled particle beam manufacturing
#165Apparatus and method for controlled particle beam manufacturing
#166Apparatus and method for controlled particle beam manufacturing
#167Apparatus and method for controlled particle beam manufacturing
#168Apparatus and method for controlled particle beam manufacturing
#169Apparatus and method for controlled particle beam manufacturing
#170Use of ion implantation in chemical etching
#171Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
#172Ion sources, systems and methods
#173Ion sources, systems and methods
#174Ion sources, systems and methods
#175Ion sources, systems and methods
#176Ion sources, systems and methods
#177Ion sources, systems and methods
#178Ion sources, systems and methods
#179Ion sources, systems and methods
#180Ion sources, systems and methods
#181Ion sources, systems and methods
#182Three-dimensional imaging using electron beam activated chemical etch
#183Ion sources, systems and methods
#184Ion sources, systems and methods
#185Ion sources, systems and methods
#186Ion sources, systems and methods
#187Ion sources, systems and methods
#188Apparatus and method for controlled particle beam manufacturing
#189Device and method for milling of material using ions
#190Ion beam etching method and ion beam etching apparatus
#191Method and apparatus for manufacturing magnetic recording media
#192Method and apparatus for preparing specimen
#193Electron beam lithography method using new material
#194Method and apparatus for the improvement of material/voltage contrast
#195Method of localizing fluorescent markers
#196Charged particle beam apparatus and sample manufacturing method
#197Ion detector for ion beam applications
#198Method and apparatus for the improvement of material/voltage contrast
#199Device and method for milling of material using ions
#200Method and apparatus for the improvement of material/voltage contrast
#201Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
#202Minute three dimensional structure producing apparatus and method
#203Method and apparatus for improved beam stability in high current gas-cluster ion beam processing system
#204Image noise removing method in FIB/SEM complex apparatus
#205Source of liquid metal ions and a method for controlling the source
#206Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission
#207Patterned atomic layer etching and deposition using miniature-column charged particle beam arrays
#208Controlling etch angles by substrate rotation in angled etch tools
#209Gas injection system for ion beam device
#210Reinforced sample for transmission electron microscope
#211Precision substrate material removal using miniature-column charged particle beam arrays