H01J2237/31742 - CPC Classification Index

ClassID:

206633 ⎘

H01J2237/31742 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Etching microareas for repairing masks

Sub-classes:

H01J2237/31744 » introducing gas in vicinity of workpiece 70

Recent Application in this class:

20250266240

2025-08-21

EDITING OF DEEP, MULTI-LAYERED STRUCTURES

20240310722

2024-09-19

METHODS AND APPARATUSES FOR PROCESSING A LITHOGRAPHIC OBJECT

20200249564

2020-08-06

Apparatus and method for repairing a photolithographic mask

20180151327

2018-05-31

Beam blanker and method for blanking a charged particle beam

20140302252

2014-10-09

Low energy ion milling or deposition

20110189593

2011-08-04

Defect repair apparatus and method for EUV mask using a hydrogen ion beam

20100084568

2010-04-08

Method and system for counting secondary particles

20080301615

2008-12-04

Focused ion beam defining process enhancement

20080283777

2008-11-20

In-situ high-resolution light-optical channel for optical viewing and surface processing in parallel with charged particle (FIB and SEM) techniques

#10

20080156998

2008-07-03

Focused Ion Beam Apparatus

#11

20080142735

2008-06-19

Charged particle-beam processing using a cluster source

#12

20060255270

2006-11-16

Semiconductor processing method and system

#13

20050279934

2005-12-22

Charged particle beam system