ClassID:

206634

H01J2237/31744 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Etching microareas for repairing masks introducing gas in vicinity of workpiece

Recent Application in this class:
#1
20240062989
2024-02-22

DEVICE FOR IMAGING AND PROCESSING A SAMPLE USING A FOCUSED PARTICLE BEAM

#2
20230341766
2023-10-26

END POINT DETERMINATION BY MEANS OF CONTRAST GAS

#3
20230081844
2023-03-16

METHOD FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK

#4
20210272772
2021-09-02

Substrate processing system, switching timing creation support device,switching timing creation support method, and substrate processing apparatus

#5
20210118678
2021-04-22

Method of material deposition

#6
20200249564
2020-08-06

Apparatus and method for repairing a photolithographic mask

#7
20190317395
2019-10-17

Method and device for permanently repairing defects of absent material of a photolithographic mask

#8
20180277361
2018-09-27

Method of material deposition

#9
20170133220
2017-05-11

Method of material deposition

#10
20160322123
2016-11-03

Repair Apparatus

#11
20150294885
2015-10-15

Gas injection system with precursor for planar deprocessing of semiconductor devices using a focused ion beam

#12
20150214006
2015-07-30

Endpoint detection for photolithography mask repair

#13
20150169997
2015-06-18

Apparatus and method for correlating images of a photolithographic mask

#14
20150053866
2015-02-26

Repair apparatus

#15
20140367571
2014-12-18

Method of welding a frozen aqueous sample to a microprobe

#16
20140357088
2014-12-04

Precursor for planar deprocessing of semiconductor devices using a focused ion beam

#17
20140255826
2014-09-11

Endpoint detection for photolithography mask repair

#18
20140131315
2014-05-15

Method of processing a material-specimen

#19
20130098292
2013-04-25

Processing system

#20
20120273458
2012-11-01

Method and apparatus for processing a substrate with a focused particle beam

#21
20120267545
2012-10-25

Processing system

#22
20120091363
2012-04-19

Processing system

#23
20100297362
2010-11-25

METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURES

#24
20100203431
2010-08-12

Beam-induced etching

#25
20100178601
2010-07-15

Photomask defect correcting method and device

#26
20100119698
2010-05-13

Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof

#27
20100051828
2010-03-04

Processing system

#28
20100032302
2010-02-11

Method to direct pattern metals on a substrate

#29
20100024730
2010-02-04

Processing system

#30
20090152460
2009-06-18

System for processing an object

#31
20090152459
2009-06-18

System and method for processing an object

#32
20090121158
2009-05-14

Apparatus and method for specimen fabrication

#33
20090121132
2009-05-14

Material processing system and method

#34
20090114851
2009-05-07

FIB milling of copper over organic dielectrics

#35
20080314871
2008-12-25

High resolution plasma etch

#36
20080142735
2008-06-19

Charged particle-beam processing using a cluster source

#37
20080099674
2008-05-01

Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof

#38
20080067437
2008-03-20

Charged beam processing apparatus

#39
20080018460
2008-01-24

Manufacturing equipment using ION beam or electron beam

#40
20080011718
2008-01-17

Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface

#41
20070264831
2007-11-15

Use of ion implantation in chemical etching

#42
20070262272
2007-11-15

Semiconductor mask correcting device and semiconductor mask correcting method

#43
20070246651
2007-10-25

Charged particle beam apparatus

#44
20070205376
2007-09-06

Working method utilizing irradiation of charged particle beam onto sample through passage in gas blowing nozzle

#45
20070187622
2007-08-16

Charged particle beam apparatus, defect correcting method, etching method, deposition method, and charge preventing method

#46
20070158590
2007-07-12

Focused ion beam processing method

#47
20070158304
2007-07-12

Etch selectivity enhancement in electron beam activated chemical etch

#48
20070158303
2007-07-12

Structural modification using electron beam activated chemical etch

#49
20070114460
2007-05-24

Charged particle beam processing method and charged particle beam apparatus

#50
20070114454
2007-05-24

Charged particle beam scan and irradiation method, charged particle beam apparatus, workpiece observation method and workpiece processing method

#51
20060284112
2006-12-21

Apparatus and method for specimen fabrication

#52
20060284090
2006-12-21

Material processing system and method

#53
20060261270
2006-11-23

Method for preparing a sample for electron microscopic examinations, and sample supports and transport holders used therefor

#54
20060228634
2006-10-12

Beam-induced etching

#55
20060219949
2006-10-05

FIB MILLING OF COPPER OVER ORGANIC DIELECTRICS

#56
20060131269
2006-06-22

Object-moving method, object-moving apparatus, production process and produced apparatus

#57
20060097194
2006-05-11

Ion beam processing method

#58
20060065853
2006-03-30

APPARATUS AND METHOD FOR MANIPULATING SAMPLE TEMPERATURE FOR FOCUSED ION BEAM PROCESSING

#59
20060022136
2006-02-02

Multiple gas injection system for charged particle beam instruments

#60
20050211925
2005-09-29

Sample repairing apparatus, a sample repairing method and a device manufacturing method using the same method

#61
20050211896
2005-09-29

PT COATING INITIATED BY INDIRECT ELECTRON BEAM FOR RESIST CONTACT HOLE METROLOGY

#62
20050199806
2005-09-15

Apparatus and method for directing gas towards a specimen

#63
20050185173
2005-08-25

Method for characterizing mask defects using image reconstruction from X-ray diffraction patterns

#64
20050167614
2005-08-04

Gas blowing nozzle of charged particle beam apparatus and charged particle beam apparatus as well as working method

#65
20050103272
2005-05-19

Material processing system and method

#66
20050087514
2005-04-28

Method for high-resolution processing of thin layers using electron beams

#67
20050072756
2005-04-07

FIB milling of copper over organic dielectrics

#68
20050072753
2005-04-07

Procedure for etching of materials at the surface with focussed electron beam induced chemical reaction at said surface

#69
20050035306
2005-02-17

Focused charged particle beam apparatus

#70
20050011758
2005-01-20

Magnetic control oscillation-scanning sputter