H01J2237/31754 - CPC Classification Index

ClassID:

206640 ⎘

H01J2237/31754 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography using particular beams or near-field effects, e.g. STM-like techniques using electron beams

Recent Application in this class:

20250336643

2025-10-30

ELECTRON BEAM PROCESSING METHODS

20240363307

2024-10-31

MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING APPARATUS, AND MARK POSITION MEASUREMENT METHOD

20240242922

2024-07-18

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

20230360880

2023-11-09

Multi-Beam Pattern Definition Device

20230056463

2023-02-23

Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method

20220238303

2022-07-28

Proximity effect correcting method, master plate manufacturing method, and drawing apparatus

20200341380

2020-10-29

Bias correction for lithography

20200251306

2020-08-06

Exposure apparatus and exposure method, lithography method, and device manufacturing method

20200190669

2020-06-18

Nanofabrication using a new class of electron beam induced surface processing techniques

#10

20200135428

2020-04-30

Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method

#11

20200118791

2020-04-16

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#12

20200072777

2020-03-05

Anomaly determination method and writing apparatus

#13

20200012195

2020-01-09

Bias correction for lithography

#14

20190304747

2019-10-03

Method for projecting a beam of particles onto a substrate with correction of scattering effects

#15

20190198294

2019-06-27

Multiple charged particle beam writing method and apparatus using beams for straddling regions

#16

20190088448

2019-03-21

Method for irradiating a target using restricted placement grids

#17

20190074161

2019-03-07

Exposure apparatus and exposure method, lithography method, and device manufacturing method

#18

20180197763

2018-07-12

Substrate alignment detection using circumferentially extending timing pattern

#19

20180149980

2018-05-31

Electron-beam lithography method and system

#20

20170371246

2017-12-28

Bias correction for lithography

#21

20170018395

2017-01-19

Nano-patterned system and magnetic-field applying device thereof

#22

20160233054

2016-08-11

Self-aligned dynamic pattern generator device and method of fabrication

#23

20160111253

2016-04-21

Method for forming resist film and charged particle beam writing method

#24

20150303029

2015-10-22

Multi charged particle beam writing apparatus, and multi charged particle beam writing method

#25

20150294836

2015-10-15

Shot data generation method and multi charged particle beam writing method

#26

20150136994

2015-05-21

Modulation device and power supply arrangement

#27

20150131075

2015-05-14

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

#28

20150123754

2015-05-07

Nano-patterned system and magnetic-field applying device thereof

#29

20150036914

2015-02-05

Method for estimating shape before shrink and CD-SEM apparatus

#30

20150028230

2015-01-29

Method for charged-particle multi-beam exposure

#31

20140346369

2014-11-27

Multi charged particle beam writing apparatus, and multi charged particle beam writing method

#32

20140268076

2014-09-18

Self-aligned dynamic pattern generator device and method of fabrication

#33

20140180462

2014-06-26

Method for estimating patterns to be printed on a plate or mask by means of electron-beam lithography and corresponding printing device

#34

20140139100

2014-05-22

Thermionic cathode with even electric field distribution on electron emitting surface

#35

20130115723

2013-05-09

Method of manufacturing semiconductor device

#36

20130078577

2013-03-28

CHARGED PARTICLE BEAM DRAWING APPARATUS, DRAWING DATA GENERATION METHOD, DRAWING DATA GENERATION PROGRAM STORAGE MEDIUM, AND ARTICLE MANUFACTURING METHOD

#37

20130063708

2013-03-14

Drawing apparatus, and method of manufacturing article

#38

20130043414

2013-02-21

System for magnetic shielding

#39

20130011796

2013-01-10

Drawing apparatus and method of manufacturing article

#40

20120312975

2012-12-13

ELECTRON BEAM EXPOSURE APPARATUS AND ELECTRON BEAM EXPOSURE METHOD

#41

20120292537

2012-11-22

Charged particle beam writing apparatus

#42

20120286168

2012-11-15

Data path for lithography apparatus

#43

20120278770

2012-11-01

METHOD AND SYSTEM FOR FORMING NON-MANHATTAN PATTERNS USING VARIABLE SHAPED BEAM LITHOGRAPHY

#44

20120115306

2012-05-10

DEFLECTOR ARRAY, CHARGED PARTICLE BEAM DRAWING APPARATUS, DEVICE MANUFACTURING METHOD, AND DEFLECTOR ARRAY MANUFACTURING METHOD

#45

20110180721

2011-07-28

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

#46

20100219357

2010-09-02

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

#47

20090212240

2009-08-27

Charged particle beam exposure system

#48

20080308751

2008-12-18

Multi-function module for an electron beam column

#49

20070257212

2007-11-08

Digital parallel electron beam lithography stamp

#50

20070222089

2007-09-27

Semiconductor wafer, semiconductor device, and method of manufacturing semiconductor device

#51

20070182303

2007-08-09

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

#52

20070085033

2007-04-19

Electron beam column for writing shaped electron beams

#53

20060141396

2006-06-29

Electron beam lithography method using new material

#54

20060103035

2006-05-18

Method of aligning an electron beam apparatus and semiconductor substrate utilizing an alignment mark

#55

20060102848

2006-05-18

Corrector for correcting first-order chromatic aberrations of the first degree

#56

20060028114

2006-02-09

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

#57

20050266322

2005-12-01

Electron beam lens for micro-column electron beam apparatus and method of fabricating the same

#58

20050263712

2005-12-01

Electron beam lens for micro-column electron beam apparatus and method of fabricating the same

#59

20050088099

2005-04-28

Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device

#60

20050087696

2005-04-28

Electron beam lens for micro-column electron beam apparatus and method of fabricating the same

#61

20050023480

2005-02-03

Corrector for correcting first-order chromatic aberrations of the first degree

#62

18121201

2026-01-06

Area selective deposition templated by hydrogen and halogen resists

#63

15470584

2018-04-24

Substrate alignment detection using circumferentially extending timing pattern