H01J2237/31752 - CPC Classification Index

ClassID:

206639 ⎘

H01J2237/31752 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography using particular beams or near-field effects, e.g. STM-like techniques

Sub-classes:

H01J2237/31754 » using electron beams 60
H01J2237/31755 » using ion beams 29
H01J2237/31757 » hybrid, i.e. charged particles and light, X-rays, plasma 4
H01J2237/31759 » using near-field effects, e.g. STM 7

Recent Application in this class:

20100019166

2010-01-28

Method for controlling electron beam in multi-microcolumn and multi-microcolumn using the same

20060124865

2006-06-15

Energetic neutral particle lithographic apparatus and process

20060118735

2006-06-08

Lithography systems and methods for operating the same