206642 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography using particular beams or near-field effects, e.g. STM-like techniques hybrid, i.e. charged particles and light, X-rays, plasma
Exposure method and method of making a semiconductor device
#2Lithography system, sensor and measuring method
#3Reliability in a maskless lithography system
#4Combined e-beam and optical exposure semiconductor lithography