Patents-Review.com
ClassID:

206645 ⎘

H01J2237/31762 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography; Patterning strategy Computer and memory organisation

Recent Application in this class:
#1
20260011529
2026-01-08

SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERFORMING A NON-CONTACT ELECTRICAL MEASUREMENT ON A CELL AND/OR NON-CONTACT ELECTRICAL MEASUREMENT CELL VEHICLE USING A REGISTRATION CELL

 #2
20250336644
2025-10-30

STAGE SPEED OBTAINING METHOD, MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, AND METHOD FOR OBTAINING COMBINATION OF STAGE SPEED AND MULTIPLICITY IN MULTIPLE CHARGED PARTICLE BEAM WRITING

 #3
20240304414
2024-09-12

SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERFORMING A NON-CONTACT ELECTRICAL MEASUREMENT ON A CELL AND/OR NON-CONTACT ELECTRICAL MEASUREMENT CELL VEHICLE USING A REGISTRATION CELL

 #4
20240105420
2024-03-28

DATA GENERATION APPARATUS, DATA GENERATION METHOD, AND COMPUTER-READABLE STORAGE MEDIUM

 #5
20230369015
2023-11-16

COVERAGE CALCULATING METHOD, CHARGED PARTICLE BEAM WRITING METHOD, COVERAGE CALCULATING DEVICE, CHARGED PARTICLE BEAM WRITING APPARATUS, AND COMPUTER-READABLE STORAGE MEDIUM

 #6
20230282444
2023-09-07

Systems, devices, and methods for aligning a particle beam and performing a non-contact electrical measurement on a cell and/or non-contact electrical measurement cell vehicle using a registration cell

 #7
20230260749
2023-08-17

OPTICAL SYSTEM ADJUSTMENT METHOD FOR MULTI CHARGED PARTICLE BEAM APPARATUS AND COMPUTER READABLE RECORDING MEDIUM

 #8
20230056463
2023-02-23

Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method

 #9
20220336187
2022-10-20

Systems, devices, and methods for aligning a particle beam and performing a non-contact electrical measurement on a cell and/or non-contact electrical measurement cell vehicle using a registration cell

 #10
20210257184
2021-08-19

Multi-beam writing method and multi-beam writing apparatus

 #11
20210098229
2021-04-01

Methods for aligning a particle beam and performing a non-contact electrical measurement on a cell using a registration cell

 #12
20200266033
2020-08-20

Charged particle beam lithography apparatus and charged particle beam pattern writing method

 #13
20200243299
2020-07-30

Detection of buried features by backscattered particles

 #14
20200135428
2020-04-30

Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method

 #15
20200043692
2020-02-06

Data processing of electron beam lithography system

 #16
20190198293
2019-06-27

Charged particle beam lithography apparatus and charged particle beam pattern writing method

 #17
20190155160
2019-05-23

Ebeam universal cutter

 #18
20190139733
2019-05-09

Data processing of electron beam lithography system

 #19
20190121236
2019-04-25

Cross scan proximity correction with ebeam universal cutter

 #20
20180366297
2018-12-20

Data processing method, charged particle beam writing apparatus, and charged particle beam writing system

 #21
20180285505
2018-10-04

Method of creating writing data

 #22
20180143526
2018-05-24

Ebeam three beam aperture array

 #23
20180108513
2018-04-19

Method and system for dimensional uniformity using charged particle beam lithography

 #24
20180060474
2018-03-01

Generating method of drawing data and charged particle beam drawing method

 #25
20170309450
2017-10-26

Charged particle beam writing apparatus and charged particle beam writing method

 #26
20170269481
2017-09-21

Cross scan proximity correction with ebeam universal cutter

 #27
20170243714
2017-08-24

Diagnosis method, charged particle beam lithography apparatus, and recording medium

 #28
20170193650
2017-07-06

Drawing data generating method

 #29
20170077029
2017-03-16

Unidirectional metal on layer with ebeam

 #30
20170076905
2017-03-16

Ebeam three beam aperture array

 #31
20170069509
2017-03-09

DATA COMPRESSION FOR EBEAM THROUGHPUT

 #32
20160322196
2016-11-03

Multi-charged particle beam writing apparatus and multi-charged particle beam writing method

 #33
20160284513
2016-09-29

Multi charged particle beam writing apparatus, and multi charged particle beam writing method

 #34
20160284510
2016-09-29

Charged particle beam drawing apparatus and drawing data generation method

 #35
20160260581
2016-09-08

Method and system for dimensional uniformity using charged particle beam lithography

 #36
20160155604
2016-06-02

Multi charged particle beam writing method, and multi charged particle beam writing apparatus

 #37
20160141144
2016-05-19

Method and apparatus for electron beam lithography

 #38
20160126062
2016-05-05

Drawing apparatus, lithography system, pattern data creation method, drawing method, and method of manufacturing articles

 #39
20160118221
2016-04-28

Lithography system and method of manufacturing articles

 #40
20160110491
2016-04-21

Writing data verification method and multi-charged particle beam writing apparatus

 #41
20160005569
2016-01-07

Charged particle beam writing apparatus and charged particle beam writing method

 #42
20150294836
2015-10-15

Shot data generation method and multi charged particle beam writing method

 #43
20150279611
2015-10-01

Charged particle beam writing apparatus and charged particle beam writing method

 #44
20150179403
2015-06-25

Method and apparatus for transferring pixel data for electron beam lithography

 #45
20150179392
2015-06-25

Method and apparatus for electron beam lithography

 #46
20150144807
2015-05-28

DRAWING DATA CREATING METHOD, DRAWING APPARATUS, DRAWING METHOD, AND ARTICLE MANUFACTURING METHOD

 #47
20150131077
2015-05-14

Electron beam lithography methods including time division multiplex loading

 #48
20150102236
2015-04-16

Electron beam exposure apparatus and method of detecting error using the same

 #49
20150014549
2015-01-15

Charged particle beam writing apparatus and charged particle beam writing method

 #50
20150008343
2015-01-08

Electron beam data storage system and method for high volume manufacturing

 #51
20140097362
2014-04-10

System and method for compressed data transmission in a maskless lithography system

 #52
20130316289
2013-11-28

Electron beam data storage system and method for high volume manufacturing

 #53
20130063708
2013-03-14

Drawing apparatus, and method of manufacturing article

 #54
20120292536
2012-11-22

Charged particle beam writing apparatus and charged particle beam writing method using a generated frame that surrounds a first data processing block

 #55
20120287410
2012-11-15

Data path for lithography apparatus

 #56
20120286168
2012-11-15

Data path for lithography apparatus

 #57
20120248340
2012-10-04

Charged particle beam writing apparatus and charged particle beam writing method

 #58
20120237877
2012-09-20

Electron beam data storage system and method for high volume manufacturing

 #59
20120126145
2012-05-24

Charged particle beam writing apparatus and charged particle beam writing method

 #60
20120091318
2012-04-19

Beamlet blanker arrangement

 #61
20110192994
2011-08-11

System and method of electron beam writing

 #62
20100302520
2010-12-02

CLUSTER E-BEAM LITHOGRAPHY SYSTEM

 #63
20100248158
2010-09-30

High-volume manufacturing massive e-beam maskless lithography system

 #64
20100078556
2010-04-01

Electron Beam Apparatus And Method of Generating An Electron Beam Irradiation Pattern

 #65
20100078555
2010-04-01

Electron beam apparatus and method of generating an electron beam irradiation pattern

 #66
20080235535
2008-09-25

Writing data processing control apparatus, writing method, and writing apparatus

 #67
20080145767
2008-06-19

Method of data encoding, compression, and transmission enabling maskless lithography

 #68
20080049204
2008-02-28

Multi-column type electron beam exposure apparatus

 #69
20070125967
2007-06-07

System and method of electron beam writing

 #70
20070057200
2007-03-15

Electron beam apparatus and method of generating an electron beam irradiation pattern

 #71
20070053242
2007-03-08

Creation method and conversion method of charged particle beam writing data, and writing method of charged particle beam

 #72
20060245633
2006-11-02

Fixed pattern extracting apparatus, pattern writing apparatus, fixed pattern extracting method and recording medium

 #73
20060155414
2006-07-13

Semiconductor manufacturing apparatus

 #74
20060093961
2006-05-04

Method of verifying electron beam data

 #75
20060074510
2006-04-06

Network-based photomask data entry interface and instruction generator for manufacturing photomasks

 #76
20060055321
2006-03-16

Hetero-junction electron emitter with Group III nitride and activated alkali halide

 #77
20050285054
2005-12-29

Charged particle beam drawing apparatus

 #78
20050270857
2005-12-08

Semiconductor manufacturing apparatus

 #79
20050256600
2005-11-17

Electron beam lithography system, method of electron beam lithography, program and method for manufacturing a semiconductor device with direct writing

 #80
20050211928
2005-09-29

Charged-particle-beam lithographic system

 #81
15469177
2018-07-10

Alignment and registration targets for charged particle beam substrate patterning and inspection