Patents-Review.com
ClassID:

206644 ⎘

H01J2237/31761 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography Patterning strategy

Sub-classes:
Recent Application in this class:
#1
20240429022
2024-12-26

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD

 #2
20230386784
2023-11-30

Method and system for determining a charged particle beam exposure for a local pattern density

 #3
20230187172
2023-06-15

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PARTICLE BEAM WRITING METHOD

 #4
20230124768
2023-04-20

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE FOR A LOCAL PATTERN DENSITY

 #5
20220051869
2022-02-17

Charged particle beam drawing device and method of controlling charged particle beam drawing device

 #6
20210313143
2021-10-07

Method and system for determining a charged particle beam exposure for a local pattern density

 #7
20210241995
2021-08-05

Charged particle beam writing apparatus, charged particle beam writing method, and a non-transitory computer-readable storage medium

 #8
20200373122
2020-11-26

Method and system for determining a charged particle beam exposure for a local pattern density

 #9
20200348597
2020-11-05

Adapting the duration of exposure slots in multi-beam writers

 #10
20200266033
2020-08-20

Charged particle beam lithography apparatus and charged particle beam pattern writing method

 #11
20200027699
2020-01-23

Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity

 #12
20190362938
2019-11-28

Charged particle beam device

 #13
20190214227
2019-07-11

Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity

 #14
20190198293
2019-06-27

Charged particle beam lithography apparatus and charged particle beam pattern writing method

 #15
20170358426
2017-12-14

Exposure apparatus and exposure method

 #16
20170301506
2017-10-19

Multi charged particle beam exposure method, and multi charged particle beam blanking apparatus

 #17
20170186584
2017-06-29

Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity

 #18
20170025253
2017-01-26

Selective processing of a workpiece using ion beam implantation and workpiece rotation

 #19
20160365226
2016-12-15

Charged particle beam lithography method and charged particle beam lithography apparatus

 #20
20160181062
2016-06-23

Multi charged particle beam writing apparatus, and multi charged particle beam writing method

 #21
20160161849
2016-06-09

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #22
20160155610
2016-06-02

Multiple charged particle beam lithography apparatus and multiple charged particle beam pattern writing method

 #23
20150371821
2015-12-24

Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity

 #24
20150347660
2015-12-03

Compensation of dose inhomogeneity using overlapping exposure spots

 #25
20140367588
2014-12-18

Method and system for E-beam lithography with multi-exposure

 #26
20140322927
2014-10-30

Drawing apparatus and method of manufacturing article

 #27
20140319367
2014-10-30

Drawing apparatus, and method of manufacturing article

 #28
20140264086
2014-09-18

Charged particle lithography system

 #29
20140264085
2014-09-18

Method for exposing a wafer

 #30
20140264066
2014-09-18

Deflection scan speed adjustment during charged particle exposure

 #31
20140106279
2014-04-17

Drawing apparatus, and method of manufacturing article

 #32
20140038107
2014-02-06

Method and system for E-beam lithography with multi-exposure

 #33
20130320243
2013-12-05

Efficient scan for E-beam lithography

 #34
20130252145
2013-09-26

Multi charged particle beam writing apparatus utilizing multiple staged mutually orthogonal beam blankers

 #35
20130177855
2013-07-11

Charged-particle beam drawing method, computer-readable recording media, and charged-particle beam drawing apparatus

 #36
20130137044
2013-05-30

Scanning apparatus, drawing apparatus, and method of manufacturing article

 #37
20130078577
2013-03-28

CHARGED PARTICLE BEAM DRAWING APPARATUS, DRAWING DATA GENERATION METHOD, DRAWING DATA GENERATION PROGRAM STORAGE MEDIUM, AND ARTICLE MANUFACTURING METHOD

 #38
20130068962
2013-03-21

Drawing apparatus, and article manufacturing method

 #39
20130056645
2013-03-07

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #40
20130024823
2013-01-24

Method and apparatus for designing patterning system based on patterning fidelity

 #41
20130019220
2013-01-17

Method for generating wiring pattern data

 #42
20120286170
2012-11-15

Dual pass scanning

 #43
20120235063
2012-09-20

Systems and methods providing electron beam writing to a medium

 #44
20120107748
2012-05-03

DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE

 #45
20110207053
2011-08-25

Exposure method and method of making a semiconductor device

 #46
20100302520
2010-12-02

CLUSTER E-BEAM LITHOGRAPHY SYSTEM

 #47
20080277598
2008-11-13

Electron beam exposure apparatus involving the position and velocity calculation

 #48
20070181829
2007-08-09

Electron-beam exposure system

 #49
20070114462
2007-05-24

Charged particle beam irradiation method and charged particle beam apparatus

 #50
20060289805
2006-12-28

Electron beam lithography apparatus, lithography method, lithography program, and manufacturing method of a semiconductor device

 #51
20060219954
2006-10-05

Methods and apparatus for glitch recovery in stationary-beam ion implantation process using fast ion beam control

 #52
20060118734
2006-06-08

Charged beam drawing data creation method, charged beam drawing method, charged beam drawing apparatus and semiconductor device manufacturing method

 #53
20050271956
2005-12-08

Method and apparatus for generating exposure data

 #54
20050269524
2005-12-08

Spatial-phase locking of energy beams for determining two-dimensional location and beam shape

 #55
20050170265
2005-08-04

Mask, exposure method and production method of semiconductor device

 #56
20050133739
2005-06-23

Charged beam writing method and writing tool

 #57
20050035308
2005-02-17

Pattern writing equipment

 #58
20050018496
2005-01-27

Electron-beam writing device and electron-beam writing method

 #59
18121201
2026-01-06

Area selective deposition templated by hydrogen and halogen resists

 #60
16422269
2020-08-18

Method and system for determining a charged particle beam exposure for a local pattern density

 #61
14607821
2015-12-08

Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems