206646 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography; Patterning strategy Dividing into sub-patterns
METHOD AND APPARATUS FOR ELECTRON BEAM EXPOSURE
#2MULTI-CHARGED PARTICLE BEAM WRITING METHOD, MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM STORING A PROGRAM
#3MULTI-CHARGED PARTICLE BEAM WRITING METHOD
#4STAGE SPEED OBTAINING METHOD, MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, AND METHOD FOR OBTAINING COMBINATION OF STAGE SPEED AND MULTIPLICITY IN MULTIPLE CHARGED PARTICLE BEAM WRITING
#5MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND STORAGE MEDIUM
#6METHOD FOR GENERATING WRITING DATA, WRITING DATA GENERATION APPARATUS, METHOD OF CHARGED-PARTICLE BEAM WRITING, CHARGED-PARTICLE BEAM WRITING APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM
#7MULTI-CHARGED PARTICLE BEAM WRITING METHOD AND MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS
#8MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS
#9Massive overlay metrology sampling with multiple measurement columns
#10MULTI-ELECTRON BEAM WRITING APPARATUS AND MULTI-ELECTRON BEAM WRITING METHOD
#11Method and system for fabricating unique chips using a charged particle multi-beamlet lithography system
#12Multi-charged particle beam writing apparatus and multi-charged particle beam writing method
#13Multi charged particle beam evaluation method and multi charged particle beam writing device
#14Multi-beam writing method and multi-beam writing apparatus
#15Multi charged particle beam writing apparatus and multi charged particle beam writing method
#16Method and system for fabricating unique chips using a charged particle multi-beamlet lithography system
#17Ebeam universal cutter
#18Cross scan proximity correction with ebeam universal cutter
#19Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus
#20METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE
#21Method of creating writing data
#22Ebeam three beam aperture array
#23Method and system for dimensional uniformity using charged particle beam lithography
#24Generating method of drawing data and charged particle beam drawing method
#25Particle beam system and method for operating a particle optical unit
#26Method and system for forming a pattern on a reticle using charged particle beam lithography
#27Charged particle beam writing apparatus and charged particle beam writing method
#28Cross scan proximity correction with ebeam universal cutter
#29Method and System for Forming Patterns Using Charged Particle Beam Lithography with Variable Pattern Dosage
#30Unidirectional metal on layer with ebeam
#31Ebeam three beam aperture array
#32Charged particle beam lithography apparatus and charged particle beam lithography method
#33Drawing data creation method and charged particle beam drawing apparatus
#34System and method for scanning an object with an electron beam using overlapping scans and electron beam counter-deflection
#35Charged particle beam lithography method and charged particle beam lithography apparatus
#36Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
#37Multi charged particle beam writing apparatus, and multi charged particle beam writing method
#38Multi-beam writing of pattern areas of relaxed critical dimension
#39Method and system for dimensional uniformity using charged particle beam lithography
#40Method and system for forming a pattern on a reticle using charged particle beam lithography
#41System and technique for rasterizing circuit layout data
#42Method for generating writing data
#43Drawing apparatus, lithography system, pattern data creation method, drawing method, and method of manufacturing articles
#44Lithography system and method of manufacturing articles
#45Writing data verification method and multi-charged particle beam writing apparatus
#46Method of generating write data, multi charged particle beam writing apparatus, and pattern inspection apparatus
#47Lithography method with combined optimization of the radiated energy and of the geometry applicable to complex shapes
#48Correction of short-range dislocations in a multi-beam writer
#49Compensation of imaging deviations in a particle-beam writer using a convolution kernel
#50Customizing a particle-beam writer using a convolution kernel
#51Charged particle beam writing apparatus and charged particle beam writing method
#52Particle beam system and method for operating a particle optical unit
#53Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
#54Charged particle beam writing apparatus and charged particle beam writing method
#55Method and system for forming patterns with charged particle beam lithography
#56Multi charged particle beam writing apparatus and multi charged particle beam writing method
#57Electron beam drawing apparatus, electron beam drawing method, and storage medium
#58Free form fracturing method for electronic or optical lithography
#59Multi charged particle beam writing apparatus and multi charged particle beam writing method
#60Charged particle beam writing method and charged particle beam writing apparatus
#61Method for charged-particle multi-beam exposure
#62Electron beam data storage system and method for high volume manufacturing
#63Drawing apparatus, and method of manufacturing article by controlling a plurality of charged particle optical systems based on respective sets of sub-drawing regions
#64Multi charged particle beam writing method, and multi charged particle beam writing apparatus
#65Charged particle beam writing apparatus and method for acquiring dose modulation coefficient of charged particle beam
#66Charged particle lithography system
#67Method for exposing a wafer
#68Deflection scan speed adjustment during charged particle exposure
#69Free form fracturing method for electronic or optical lithography
#70Method and system for forming patterns with charged particle beam lithography
#71Exposure apparatus for forming a reticle
#72Multi charged particle beam writing apparatus and multi charged particle beam writing method
#73Method and system for forming a pattern on a reticle using charged particle beam lithography
#74Method and system for forming a pattern on a reticle using charged particle beam lithography
#75Charged particle beam writing apparatus and charged particle beam writing method
#76Method and system for improving critical dimension uniformity using shaped beam lithography
#77Method and system for preparing a pattern to be printed on a plate or mask by electron beam lithography
#78Charged particle beam writing apparatus and irradiation time apportionment method of charged particle beams for multiple writing
#79Electron beam lithography system and method for improving throughput
#80Electron beam lithography system and method for improving throughput
#81Smart subfield method for E-beam lithography
#82Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes
#83Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages
#84Structure and method for E-beam writing
#85Method and system for forming high precision patterns using charged particle beam lithography
#86Large-mesh cell-projection electron-beam lithography method
#87Method and System for Optimization of an Image on a Substrate to be Manufactured Using Optical Lithography
#88Multi charged particle beam writing apparatus and multi charged particle beam writing method
#89Exposure apparatus for forming a reticle and method of forming a reticle using the same
#90Method for generating wiring pattern data
#91Drawing apparatus and method of manufacturing article
#92Method and system for forming patterns with charged particle beam lithography
#93Charged particle beam writing apparatus
#94Charged particle beam writing apparatus and charged particle beam writing method using a generated frame that surrounds a first data processing block
#95Methods of forming a photolithography reticle
#96CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD
#97Dual pass scanning
#98Method and system for fracturing a pattern using lithography with multiple exposure passes
#99METHOD AND SYSTEM FOR FORMING NON-MANHATTAN PATTERNS USING VARIABLE SHAPED BEAM LITHOGRAPHY
#100Electron beam lithography system and method for improving throughput
#101Electron beam data storage system and method for high volume manufacturing
#102METHOD AND SYSTEM FOR DESIGN OF A SURFACE TO BE MANUFACTURED USING CHARGED PARTICLE BEAM LITHOGRAPHY
#103DRAWING APPARATUS, DRAWING METHOD AND METHOD OF MANUFACTURING ARTICLE
#104METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE
#105METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH OVERLAPPING SHOTS
#106Charged particle beam writing apparatus and charged particle beam writing method
#107Method and system for feature function aware priority printing
#108Beam dose computing method and writing method and record carrier body and writing apparatus
#109Charged particle beam writing apparatus and charged particle beam writing method
#110Method for manufacturing semiconductor device by correcting overlapping shots based on a radiation influenced pattern
#111Charged particle beam writing apparatus, write data creation method and charged particle beam writing method
#112Method and system for feature function aware priority printing
#113Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area
#114Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages
#115Beam dose computing method and writing method and record carrier body and writing apparatus
#116Exposure data generator and method thereof
#117Device manufacturing method, lithographic apparatus and device manufactured thereby
#118Lithography system and projection method
#119Method for writing a large-area closed curvilinear pattern with a cartesian electron beam writing system
#120Method of forming pattern writing data by using charged particle beam
#121Pattern generation method and charged particle beam writing apparatus
#122Beam dose computing method and writing method and record carrier body and writing apparatus for determining an optimal dose of a charged particle beam
#123Electron beam lithography system
#124Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system
#125Electron beam exposure apparatus, electron beam exposure method and method of manufacturing semiconductor device
#126Exposure data generator and method thereof
#127Methods of forming mask patterns, methods of correcting feature dimension variation, microlithography methods, recording medium and electron beam exposure system
#128Charged beam exposure apparatus, charged beam control method and manufacturing method of semiconductor device
#129Multi-electron beam exposure method and apparatus
#130Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system
#131Photo mask, method of manufacturing photo mask, and method of generating mask data
#132Alignment and registration targets for charged particle beam substrate patterning and inspection
#133Alignment and registration targets for charged particle beam substrate patterning and inspection