H01J2237/31766 - CPC Classification Index

ClassID:

206647 ⎘

H01J2237/31766 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography; Patterning strategy Continuous moving of wafer

Recent Application in this class:

20250349508

2025-11-13

Apparatus and Method for Writing a Moveable Target in a Multi-Column Exposure Apparatus

20250349507

2025-11-13

Controlling the Relative Position of a Moveable Target and Charged-Particle Beams in a Multi-Column Exposure Apparatus

20250021014

2025-01-16

SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED ON A COMPLIANT NANO SERVO MOTION SYSTEM

20190013175

2019-01-10

Aperture size modulation to enhance ebeam patterning resolution

20180166248

2018-06-14

Blanking deflector, and multi charged particle beam writing apparatus using three deflector electrodes and a transmission line

20170358426

2017-12-14

Exposure apparatus and exposure method

20170103869

2017-04-13

Multi charged particle beam writing method, and multi charged particle beam writing apparatus

20170025253

2017-01-26

Selective processing of a workpiece using ion beam implantation and workpiece rotation

20170018404

2017-01-19

Drawing data creation method and charged particle beam drawing apparatus

#10

20160336147

2016-11-17

Multi-beam writing using inclined exposure stripes

#11

20160314934

2016-10-27

Exposure apparatus and exposure method

#12

20160314930

2016-10-27

Device, manufacturing method, and exposure apparatus

#13

20160276131

2016-09-22

Bi-directional double-pass multi-beam writing

#14

20160189930

2016-06-30

Exposure apparatus and exposure method

#15

20160155604

2016-06-02

Multi charged particle beam writing method, and multi charged particle beam writing apparatus

#16

20150380213

2015-12-31

Apparatus and method for calculating drawing speeds of a charged particle beam

#17

20150064934

2015-03-05

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#18

20150028230

2015-01-29

Method for charged-particle multi-beam exposure

#19

20140322653

2014-10-30

Drawing apparatus, and method of manufacturing article

#20

20140187056

2014-07-03

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#21

20140070112

2014-03-13

Charged-particle beam exposure apparatus and method of manufacturing article

#22

20140017349

2014-01-16

Charged particle beam writing apparatus and irradiation time apportionment method of charged particle beams for multiple writing

#23

20130056647

2013-03-07

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#24

20120228516

2012-09-13

Charged particle beam drawing apparatus and article manufacturing method using same

#25

20120219914

2012-08-30

DRAWING APPARATUS, DRAWING METHOD AND METHOD OF MANUFACTURING ARTICLE

#26

20120132801

2012-05-31

Method and an apparatus of an inspection system using an electron beam

#27

20120126136

2012-05-24

Charged-particle beam exposure apparatus and method of manufacturing article

#28

20120112323

2012-05-10

Apparatus and method for controlled particle beam manufacturing

#29

20120007002

2012-01-12

Charged particle beam pattern forming apparatus and charged particle beam pattern forming method

#30

20100098922

2010-04-22

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

#31

20090200495

2009-08-13

Particle-beam exposure apparatus with overall-modulation of a patterned beam

#32

20090057556

2009-03-05

Method and apparatus of an inspection system using an electron beam

#33

20090032738

2009-02-05

CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREOF

#34

20080073588

2008-03-27

Lithography system and projection method

#35

20070284695

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#36

20070284538

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#37

20070284537

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#38

20070284527

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#39

20070278428

2007-12-06

Apparatus and method for controlled particle beam manufacturing

#40

20070278419

2007-12-06

Apparatus and method for controlled particle beam manufacturing

#41

20070278418

2007-12-06

Apparatus and method for controlled particle beam manufacturing

#42

20070252969

2007-11-01

Stage apparatus and exposure apparatus

#43

20070215803

2007-09-20

Method and an apparatus of an inspection system using an electron beam

#44

20070045534

2007-03-01

Apparatus and method for controlled particle beam manufacturing

#45

20070029506

2007-02-08

Systems, control subsystems, and methods for projecting an electron beam onto a specimen

#46

20060151699

2006-07-13

Method and an apparatus of an inspection system using an electron beam

#47

20060121396

2006-06-08

Method for exposing a substrate with a beam

#48

20060076509

2006-04-13

Electron beam irradiating method and manufacturing method of magnetic recording medium

#49

20050253093

2005-11-17

Parallel multi-electron beam lithography for IC fabrication with precise X-Y translation

#50

20050205782

2005-09-22

Method and an apparatus of an inspection system using an electron beam

#51

20050045836

2005-03-03

Dual-mode electron beam lithography machine

#52

15713419

2020-01-14

Gray-tone electron-beam lithography

#53

14542105

2017-07-25

Apparatus and methods for electron beam lithography using array cathode