206649 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography Proximity effect correction
Sub-classes:RASTER BEAM WRITING METHOD AND RASTER BEAM WRITING APPARATUS
#2MULTI-CHARGED PARTICLE BEAM WRITING METHOD, MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM STORING A PROGRAM
#3STAGE SPEED OBTAINING METHOD, MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, AND METHOD FOR OBTAINING COMBINATION OF STAGE SPEED AND MULTIPLICITY IN MULTIPLE CHARGED PARTICLE BEAM WRITING
#4PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY
#5CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM
#6Proximity effect correction in electron beam lithography
#7Proximity effect correcting method, master plate manufacturing method, and drawing apparatus
#8Method of manufacturing photomasks and method of manufacturing semiconductor devices
#9Bias correction for lithography
#10Exposure apparatus and exposure method, lithography method, and device manufacturing method
#11Proximity effect correction in electron beam lithography
#12Method of pattern data preparation and method of forming pattern in layer
#13Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity
#14Bias correction for lithography
#15Charged particle beam writing apparatus and charged particle beam writing method
#16Method for projecting a beam of particles onto a substrate with correction of scattering effects
#17Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity
#18Charged particle beam writing apparatus and charged particle beam writing method
#19Cross scan proximity correction with ebeam universal cutter
#20Method for irradiating a target using restricted placement grids
#21Exposure apparatus and exposure method, lithography method, and device manufacturing method
#22Method for acquiring parameter for dose correction of charged particle beam, charged particle beam writing method, and charged particle beam writing apparatus
#23Calibration of elementary small patterns in variable-shaped-beam electron-beam lithography
#24Method of creating writing data
#25Advanced dose-level quantization of multibeam-writers
#26Method of performing dose modulation, in particular for electron beam lithography
#27Charged particle beam writing apparatus and charged particle beam writing method
#28Bias correction for lithography
#29Method and system for forming a pattern on a reticle using charged particle beam lithography
#30Cross scan proximity correction with ebeam universal cutter
#31Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity
#32Method for determining the parameters of an IC manufacturing process model
#33Multi charged particle beam writing method, and multi charged particle beam writing apparatus
#34Method to define multiple layer patterns with a single exposure by charged particle beam lithography
#35Charged particle beam writing apparatus and charged particle beam writing method
#36Multi-beam writing of pattern areas of relaxed critical dimension
#37Method and system for forming a pattern on a reticle using charged particle beam lithography
#38Lithography method with combined optimization of the radiated energy and of the geometry applicable to complex shapes
#39Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity
#40Charged particle beam writing apparatus and method utilizing a sum of the weighted area density of each figure pattern
#41Method for estimating patterns to be printed on a plate or mask by means of electron-beam lithography and corresponding printing device
#42Modeling and correcting short-range and long-range effects in E-beam lithography
#43Providing electron beam proximity effect correction by simulating write operations of polygonal shapes
#44Smart subfield method for E-beam lithography
#45Method of correcting electron proximity effects using Voigt type scattering functions
#46Charged particle beam lithography apparatus, inspection apparatus and inspection method of pattern writing data
#47Charged particle beam writing apparatus and charged particle beam writing method
#48Charged particle beam writing apparatus and charged particle beam writing method
#49Charged particle beam writing apparatus and charged particle beam writing method
#50Method for correcting electronic proximity effects using off-center scattering functions
#51Method and apparatus for designing patterning system based on patterning fidelity
#52METHODS OF ESTIMATING POINT SPREAD FUNCTIONS IN ELECTRON-BEAM LITHOGRAPHY PROCESSES
#53METHOD AND SYSTEM FOR FORMING NON-MANHATTAN PATTERNS USING VARIABLE SHAPED BEAM LITHOGRAPHY
#54Electron beam exposure apparatus and electron beam exposure method
#55Method for compensating proximity effects of particle beam lithography processes
#56METHOD AND SYSTEM FOR DESIGN OF ENHANCED ACCURACY PATTERNS FOR CHARGED PARTICLE BEAM LITHOGRAPHY
#57Providing electron beam proximity effect correction by simulating write operations of polygonal shapes
#58Beam dose computing method and writing method and record carrier body and writing apparatus
#59Semiconductor device
#60Charged particle beam writing apparatus, write data creation method and charged particle beam writing method
#61Charged particle beam writing apparatus and charged particle beam writing method
#62Charged particle beam drawing apparatus and proximity effect correction method thereof
#63Electron Beam Apparatus And Method of Generating An Electron Beam Irradiation Pattern
#64Electron beam apparatus and method of generating an electron beam irradiation pattern
#65Beam dose computing method and writing method and record carrier body and writing apparatus
#66Exposure data generator and method thereof
#67Semiconductor device
#68AREA BASED OPTICAL PROXIMITY CORRECTION IN RASTER SCAN PRINTING
#69Pattern writing and forming method
#70Charged particle beam writing method and apparatus
#71Charged particle beam writing method and apparatus and readable storage medium
#72Beam dose computing method and writing method and record carrier body and writing apparatus for determining an optimal dose of a charged particle beam
#73Placement effects correction in raster pattern generator
#74Critical dimension effects correction in raster pattern generator
#75Electron beam apparatus and method of generating an electron beam irradiation pattern
#76Method for correcting electron beam exposure data
#77Electron-beam exposure system
#78Pattern drawing system, electrically charged beam drawing method, photomask manufacturing method, and semiconductor device manufacturing method
#79Exposure data generator and method thereof
#80Parameter control in a lithographic apparatus using polarization
#81Methods of forming mask patterns, methods of correcting feature dimension variation, microlithography methods, recording medium and electron beam exposure system
#82Electron beam exposure mask, electron beam exposure method, and electron beam exposure system
#83Method of generation of charged particle beam exposure data and charged particle beam exposure method using a block mask
#84Area based optical proximity correction in raster scan printing
#85Method for reducing the fogging effect
#86Process for controlling the proximity effect correction
#87Reticle manipulations
#88System and method for proximity effect correction in imaging systems
#89Electron beam writing method and lithography mask manufacturing method
#90Method of verifying proximity effect correction in electron beam lithography
#91Method and system for forming a mask pattern, method of manufacturing a semiconductor device, system forming a mask pattern on data, cell library and method of forming a photomask
#92Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method
#93Pattern correction method, pattern correction system, mask manufacturing method, semiconductor device manufacturing method, recording medium, and designed pattern
#94Photo mask, method of manufacturing photo mask, and method of generating mask data
#95Effective temperature calculation method for multi-charged particle beam writing region, multi-charged particle beam writing apparatus, multi-charged particle beam writing method, and recording medium recording program