Patents-Review.com
ClassID:

206650 ⎘

H01J2237/31771 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography; Proximity effect correction using multiple exposure

Recent Application in this class:
#1
20240337951
2024-10-10

Method of manufacturing photo masks

 #2
20230386784
2023-11-30

Method and system for determining a charged particle beam exposure for a local pattern density

 #3
20230288813
2023-09-14

Method of manufacturing photo masks

 #4
20230124768
2023-04-20

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE FOR A LOCAL PATTERN DENSITY

 #5
20220260926
2022-08-18

Method of manufacturing photo masks

 #6
20210313143
2021-10-07

Method and system for determining a charged particle beam exposure for a local pattern density

 #7
20210225611
2021-07-22

Charged particle beam optical apparatus, exposure apparatus, exposure method, control apparatus, control method, information generation apparatus, information generation method and device manufacturing method

 #8
20210055646
2021-02-25

Method of manufacturing photo masks

 #9
20200373122
2020-11-26

Method and system for determining a charged particle beam exposure for a local pattern density

 #10
20200098545
2020-03-26

Dummy insertion for improving throughput of electron beam lithography

 #11
20200051780
2020-02-13

Charged particle beam optical apparatus, exposure apparatus, exposure method, control apparatus, control method, information generation apparatus, information generation method and device manufacturing method

 #12
20190148110
2019-05-16

Method of manufacturing photo masks

 #13
20180374675
2018-12-27

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE

 #14
20180261421
2018-09-13

MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

 #15
20180108513
2018-04-19

Method and system for dimensional uniformity using charged particle beam lithography

 #16
20180082820
2018-03-22

Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices

 #17
20170213698
2017-07-27

Method and System for Forming Patterns Using Charged Particle Beam Lithography with Variable Pattern Dosage

 #18
20170124247
2017-05-04

Shaped beam lithography including temperature effects

 #19
20170098524
2017-04-06

Multi charged particle beam writing method and multi charged particle beam writing apparatus

 #20
20170023862
2017-01-26

METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM LITHOGRAPHY

 #21
20160299422
2016-10-13

Method and system for forming patterns using charged particle beam lithography with variable pattern dosage

 #22
20160260581
2016-09-08

Method and system for dimensional uniformity using charged particle beam lithography

 #23
20160042908
2016-02-11

Multi charged particle beam writing method and multi charged particle beam writing apparatus

 #24
20150331991
2015-11-19

Method and system for forming patterns using charged particle beam lithography with variable pattern dosage

 #25
20150261907
2015-09-17

Method and system for forming patterns with charged particle beam lithography

 #26
20150194289
2015-07-09

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #27
20140229904
2014-08-14

Method and system for forming patterns with charged particle beam lithography

 #28
20140124684
2014-05-08

Multi charged particle beam writing method and multi charged particle beam writing apparatus

 #29
20140065548
2014-03-06

Lithography apparatus including display unit for updating data and article manufacturing method using same

 #30
20140033144
2014-01-30

Providing electron beam proximity effect correction by simulating write operations of polygonal shapes

 #31
20130205264
2013-08-08

Method and system for forming high precision patterns using charged particle beam lithography

 #32
20130070222
2013-03-21

Method and System for Optimization of an Image on a Substrate to be Manufactured Using Optical Lithography

 #33
20120329289
2012-12-27

Method and system for forming patterns with charged particle beam lithography

 #34
20120221985
2012-08-30

METHOD AND SYSTEM FOR DESIGN OF A SURFACE TO BE MANUFACTURED USING CHARGED PARTICLE BEAM LITHOGRAPHY

 #35
20120221981
2012-08-30

Method and system for design of enhanced edge slope patterns for charged particle beam lithography

 #36
20120221980
2012-08-30

METHOD AND SYSTEM FOR DESIGN OF ENHANCED ACCURACY PATTERNS FOR CHARGED PARTICLE BEAM LITHOGRAPHY

 #37
20120219886
2012-08-30

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE

 #38
20120217421
2012-08-30

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH OVERLAPPING SHOTS

 #39
20120211674
2012-08-23

Charged particle beam writing apparatus and charged particle beam writing method

 #40
20120192126
2012-07-26

Providing electron beam proximity effect correction by simulating write operations of polygonal shapes

 #41
20120047474
2012-02-23

Method for manufacturing semiconductor device by correcting overlapping shots based on a radiation influenced pattern

 #42
20120001097
2012-01-05

Charged particle beam drawing apparatus and control method thereof

 #43
20110195359
2011-08-11

Self-contained proximity effect correction inspiration for advanced lithography (special)

 #44
20100266959
2010-10-21

Pattern forming method

 #45
20080073588
2008-03-27

Lithography system and projection method

 #46
16422269
2020-08-18

Method and system for determining a charged particle beam exposure for a local pattern density