H01J2237/31779 - CPC Classification Index

ClassID:

206655 ⎘

H01J2237/31779 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography by projection from patterned photocathode

Recent Application in this class:

20210335572

2021-10-28

MODULAR PARALLEL ELECTRON LITHOGRAPHY

20200266033

2020-08-20

Charged particle beam lithography apparatus and charged particle beam pattern writing method

20190198293

2019-06-27

Charged particle beam lithography apparatus and charged particle beam pattern writing method

20160181050

2016-06-23

Integrated photoemission sources and scalable photoemission structures

20120224155

2012-09-06

Direct write lithography system

20120223245

2012-09-06

ELECTRON BEAM SOURCE SYSTEM AND METHOD

20090127473

2009-05-21

Electron beam irradiation device

20080169436

2008-07-17

Electron beam lithography method and apparatus using a dynamically controlled photocathode

20070278425

2007-12-06

Method of operating emitter for electron-beam projection lithography system

#10

20060151719

2006-07-13

Electron beam duplication lithography method

#11

20060055321

2006-03-16

Hetero-junction electron emitter with Group III nitride and activated alkali halide

#12

20050224726

2005-10-13

Direct write lithography system

#13

20050121623

2005-06-09

Electron beam duplication lithography method and apparatus

#14

20050077833

2005-04-14

Emitter for electron-beam projection lithography system, and method of manufacturing and operating the emitter