206654 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography by projection
Sub-classes:Optimizing Image Distortion in a Multi Beam Charged Particle Processing Apparatus
#2Pattern formation method and template manufacturing method
#3Method for projecting a beam of particles onto a substrate with correction of scattering effects
#4METHOD FOR ELECTRONIC LITHOGRAPHY WITH ELECTROSTATIC SCREENING
#5Optical fiber feedthrough device and fiber path arrangement
#6Blanking aperture array apparatus, charged particle beam lithography apparatus, and electrode testing method
#7Projection exposure apparatus for microlithography comprising an optical distance measurement system
#8Direct write lithography system
#9Lithography system and projection method
#10Particle-beam exposure apparatus with overall-modulation of a patterned beam
#11Lithography system and projection method
#12Focusing apparatus and lithography system using the same
#13Direct write lithography system
#14Method of producing electron beam writing data, program of producing electron beam writing data, and electron beam writing apparatus