206660 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography by projection through mask
Focused ion beam processing apparatus
#2Ion beam lithography method based on ion beam lithography system
#3Charged particle beam writing apparatus and charged particle beam writing method
#4Charged particle beam writing apparatus and charged particle beam writing method
#5Charged-particle beam exposure method and charged-particle beam correction method
#6Apparatus and methods for aberration correction in electron beam based system
#7Modeling and correcting short-range and long-range effects in E-beam lithography
#8System and method of electron beam writing
#9FOCUSSING MASK
#10Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same
#11Installation and method of nanofabrication
#12Charged-particle exposure apparatus
#13SOI substrate, mask blank for charged particle beam exposure, and mask for charged particle beam exposure
#14Electron-beam exposure system
#15System and method of electron beam writing
#16Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
#17Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same
#18Lithography systems and methods for operating the same
#19Large area electron emission system for application in mask-based lithography, maskless lithography II and microscopy
#20Nonlithographic method of defining geometries for plasma and/or ion implantation treatments on a semiconductor wafer
#21System and method for passing particles on selected areas on a wafer
#22Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
#23Mask, exposure method and production method of semiconductor device
#24Mask, method of production of same, and method of production of semiconductor device
#25Transfer mask for exposure and pattern exchanging method of the same
#26Exposure system and exposure method
#27Ion printer
#28Stencil mask, production method thereof, exposure apparatus, exposure method and electronic device production method
#29Stencil mask, charged particle irradiation apparatus and the method
#30Apparatus and methods for aberration correction in electron beam based system