206661 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography by projection Reflection mask
Self-aligned dynamic pattern generator device and method of fabrication
#2Bonding pad surface damage reduction in a formation of digital pattern generator
#3Apparatus and methods for aberration correction in electron beam based system
#4Dynamic pattern generator and method of toggling mirror cells of the dynamic pattern generator
#5Method and apparatus for transferring pixel data for electron beam lithography
#6Method and apparatus for electron beam lithography
#7Mirror array in digital pattern generator (DPG)
#8E-beam lithography with alignment gating
#9Self-aligned dynamic pattern generator device and method of fabrication
#10Charged particle lithography system with a long shape illumination beam
#11System and method for compressed data transmission in a maskless lithography system
#12Devices and methods for improved reflective electron beam lithography
#13Linear Stage for reflective electron beam lithography
#14Reflection electron beam projection lithography using an ExB separator
#15Electron reflector with multiple reflective modes
#16Method and apparatus for surface potential reflection electron mask lithography
#17Exposure method, mask fabrication method, fabrication method of semiconductor device, and exposure apparatus
#18Apparatus and methods for aberration correction in electron beam based system