Patents-Review.com
ClassID:

206664 ⎘

H01J2237/31794 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography; Problems associated with lithography affecting masks

Recent Application in this class:
#1
20240395492
2024-11-28

COMPENSATION RASTER SCANNING

 #2
20230280647
2023-09-07

METHOD AND APPARATUS FOR MASK REPAIR

 #3
20230238209
2023-07-27

APPARATUS FOR ANALYZING AND/OR PROCESSING A SAMPLE WITH A PARTICLE BEAM AND METHOD

 #4
20220050389
2022-02-17

Method, apparatus and computer program for analyzing and/or processing of a mask for lithography

 #5
20200402793
2020-12-24

A METHOD FOR CREATING STRUCTURES OR DEVICES USING AN ORGANIC ICE RESIST

 #6
20180037993
2018-02-08

Digital pattern generator having charge drain coating

 #7
20160358742
2016-12-08

Charge drain coating for electron-optical MEMS

 #8
20140114634
2014-04-24

Modeling and correcting short-range and long-range effects in E-beam lithography

 #9
20130253688
2013-09-26

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #10
20090311613
2009-12-17

Mask for multi-column electron beam exposure, and electron beam exposure apparatus and exposure method using the same

 #11
20090127473
2009-05-21

Electron beam irradiation device

 #12
20070295918
2007-12-27

Method for fabricating semiconductor device and equipment for fabricating the same

 #13
20070200174
2007-08-30

SOI substrate, mask blank for charged particle beam exposure, and mask for charged particle beam exposure

 #14
20070054203
2007-03-08

Mask, method of producing mask, and method of producing semiconductor device

 #15
20070054202
2007-03-08

Mask, method of producing mask, and method of producing semiconductor device

 #16
20060269850
2006-11-30

Mask, method of producing the same, and method of producing semiconductor device

 #17
20060240330
2006-10-26

Exposure method, mask, semiconductor device manufacturing method, and semiconductor device

 #18
20060124581
2006-06-15

Mask blank for charged particle beam exposure, method of forming mask blank and mask for charged particle beam exposure

 #19
20060079091
2006-04-13

Mask, method of producing the same, and method of producing semiconductor device

 #20
20050214654
2005-09-29

ESD-resistant photomask and method of preventing mask ESD damage

 #21
20050145892
2005-07-07

Mask, semiconductor device manufacturing method, and semiconductor device

 #22
20050133734
2005-06-23

Exposure apparatus, exposure method and semiconductor device production method

 #23
20050124078
2005-06-09

Mask pattern correction method, semiconductor device manufacturing method, mask manufacturing method and mask

 #24
20050118516
2005-06-02

Transfer mask for exposure and pattern exchanging method of the same

 #25
20050058913
2005-03-17

Stencil mask, charged particle irradiation apparatus and the method

 #26
20050014076
2005-01-20

Method of generating mask distortion data, exposure method and method of producing semiconductor device