H01J2237/31793 - CPC Classification Index

ClassID:

206663 ⎘

H01J2237/31793 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography Problems associated with lithography

Sub-classes:

H01J2237/31794 » affecting masks 26
H01J2237/31796 » affecting resists 23
H01J2237/31798 » detecting pattern defects 32

Recent Application in this class:

20220285124

2022-09-08

ABERRATION CORRECTION IN CHARGED PARTICLE SYSTEM

20200064743

2020-02-27

Exposure device

20190333734

2019-10-31

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD

20190237297

2019-08-01

Charged particle beam writing method and charged particle beam writing apparatus

20190189389

2019-06-20

Charged particle beam writing apparatus and charged particle beam writing method

20190103252

2019-04-04

Multi charged particle beam writing apparatus and multi charged particle beam writing method

20180342371

2018-11-29

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD

20180277334

2018-09-27

Aberration correction in charged particle system

20170115167

2017-04-27

Temperature measuring mask and temperature measuring method

#10

20160368031

2016-12-22

Particle beam apparatus and method for operating a particle beam apparatus

#11

20160284509

2016-09-29

Charged particle beam writing apparatus and method for calculating irradiation coefficient

#12

20160181065

2016-06-23

Charged particle beam drawing apparatus and charged particle beam drawing method

#13

20160161849

2016-06-09

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#14

20160066478

2016-03-03

Cabinet for electronic equipment

#15

20150270101

2015-09-24

Method for correcting drift of charged particle beam, and charged particle beam writing apparatus

#16

20150241767

2015-08-27

Mask manufacturing method, mask substrate, and charged beam drawing method

#17

20150155130

2015-06-04

DRAWING APPARATUS, DRAWING METHOD, AND METHOD FOR MANUFACTURING ARTICLE

#18

20150001423

2015-01-01

Device for spot size measurement at wafer level using a knife edge and a method for manufacturing such a device

#19

20140322831

2014-10-30

Lithography apparatus, lithography method, and method of manufacturing article

#20

20130252145

2013-09-26

Multi charged particle beam writing apparatus utilizing multiple staged mutually orthogonal beam blankers

#21

20130115723

2013-05-09

Method of manufacturing semiconductor device

#22

20130068962

2013-03-21

Drawing apparatus, and article manufacturing method

#23

20130043414

2013-02-21

System for magnetic shielding

#24

20120286168

2012-11-15

Data path for lithography apparatus

#25

20120256084

2012-10-11

Electron beam drift detection device and method for detecting electron beam drift

#26

20120211676

2012-08-23

Charged particle beam writing apparatus and charged particle beam writing method

#27

20120153487

2012-06-21

SUBSTRATE FOR ELECTRON-BEAM DRAWING

#28

20110255388

2011-10-20

Pattern writing system and method and abnormality diagnosing method

#29

20100044594

2010-02-25

Apparatus for aligning a particle-beam-generated pattern to a pattern on a pre-patterned substrate

#30

20090008551

2009-01-08

Electron beam apparatus with aberration corrector

#31

20080258084

2008-10-23

Charged-particle exposure apparatus

#32

20080169433

2008-07-17

Electron beam exposure apparatus and method for cleaning the same

#33

20070194250

2007-08-23

Charged particle beam writing method and apparatus

#34

20070114461

2007-05-24

Charged beam drawing apparatus and charged beam drawing method

#35

20070114409

2007-05-24

Electron beam apparatus with aberration corrector

#36

20070085027

2007-04-19

Real-time compensation of mechanical position error in pattern generation or imaging applications

#37

20070072099

2007-03-29

Method of aligning a particle-beam-generated pattern to a pattern on a pre-patterned substrate

#38

20070024864

2007-02-01

Position measurement apparatus and method and pattern forming apparatus and writing method

#39

20070023689

2007-02-01

Electron beam drift correction method and electron beam writing method

#40

20060223200

2006-10-05

Semiconductor manufacture method

#41

20060151720

2006-07-13

Electromagnetic focusing method for electron-beam lithography system

#42

20060076514

2006-04-13

Charged particle beam processing apparatus

#43

20060076508

2006-04-13

System, method and a program for correcting conditions for controlling a charged particle beam for lithography and observation, and a program and method for manufacturing a semiconductor device

#44

20060060781

2006-03-23

Charged-particle beam apparatus and method for automatically correcting astigmatism and for height detection

#45

20060016991

2006-01-26

Electron beam apparatus with aberration corrector

#46

20060011080

2006-01-19

Method and apparatus for electron-beam lithography

#47

20050211929

2005-09-29

Charged particle beam photolithography machine, standard substrate for correcting misalignment factor of charged particle beam photolithography machine, correcting method for charged particle beam photolithography machine, and method of manufacturing electronic device