206665 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography; Problems associated with lithography affecting resists
Nanofabrication using a new class of electron beam induced surface processing techniques
#2Method for determining the parameters of an IC manufacturing process model
#3Ebeam non-universal cutter
#4Method to define multiple layer patterns with a single exposure by charged particle beam lithography
#5Charged particle beam writing apparatus and charged particle beam writing method
#6Charged particle beam writing apparatus, charged particle beam writing method, and shot correction method of charged particle beam writing method
#7Multi charged particle beam writing apparatus and multi charged particle beam writing method
#8Method and apparatus for predicting a growth rate of deposited contaminants
#9Method for estimating shape before shrink and CD-SEM apparatus
#10Charged-particle beam drawing method, computer-readable recording media, and charged-particle beam drawing apparatus
#11CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFFECT CORRECTION METHOD THEREOF
#12Charged particle beam writing apparatus and charged particle beam writing method
#13Method and system for modifying patterned photoresist using multi-step ion implantation
#14Substrate to be processed having laminated thereon resist film for electron beam and organic conductive film, method for manufacturing the same, and resist patterning process
#15Charged particle beam pattern forming apparatus and charged particle beam pattern forming method
#16Pattern writing system and method and abnormality diagnosing method
#17CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFFECT CORRECTION METHOD THEREOF
#18Charged particle beam writing apparatus and method thereof
#19Placement effects correction in raster pattern generator
#20Apparatus and method for controlling the beam current of a charged particle beam
#21Micromachining process, system and product
#22Electron beam lithography method using new material
#23Method for reducing proximity effects in electron beam lithography