Patents-Review.com
ClassID:

206666 ⎘

H01J2237/31798 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography; Problems associated with lithography detecting pattern defects

Recent Application in this class:
#1
20260066219
2026-03-05

CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM STORING A PROGRAM

 #2
20250165686
2025-05-22

RECOVERY OF A HIERARCHICAL FUNCTIONAL REPRESENTATION OF AN INTEGRATED CIRCUIT

 #3
20250021014
2025-01-16

SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED ON A COMPLIANT NANO SERVO MOTION SYSTEM

 #4
20230289502
2023-09-14

Recovery of a hierarchical functional representation of an integrated circuit

 #5
20220068592
2022-03-03

System and method for bare wafer inspection

 #6
20210240894
2021-08-05

Recovery of a hierarchical functional representation of an integrated circuit

 #7
20200072777
2020-03-05

Anomaly determination method and writing apparatus

 #8
20200027693
2020-01-23

System and method for bare wafer inspection

 #9
20190362938
2019-11-28

Charged particle beam device

 #10
20190360951
2019-11-28

Multiple charged particle beam inspection apparatus and multiple charged particle beam inspection method

 #11
20190355628
2019-11-21

Process window analysis

 #12
20190304749
2019-10-03

Multiple charged particle beam writing apparatus, and multiple charged particle beam writing method

 #13
20190172678
2019-06-06

Method of obtaining beam deflection shape and method of obtaining arrangement angle of blanking aperture array plate

 #14
20190043692
2019-02-07

CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRITING METHOD, AND PATTERN FORMING METHOD

 #15
20180330911
2018-11-15

Method and apparatus for an imaging system

 #16
20180315670
2018-11-01

Guided scanning electron microscopy metrology based on wafer topography

 #17
20180233456
2018-08-16

Method for determining misalignment between a first and a second etching zones

 #18
20180144905
2018-05-24

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #19
20180138013
2018-05-17

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #20
20180138012
2018-05-17

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #21
20180076006
2018-03-15

Blanking aperture array apparatus, charged particle beam lithography apparatus, and electrode testing method

 #22
20170263416
2017-09-14

Method for structuring an object and associated particle beam system

 #23
20170243717
2017-08-24

Multi electron beam inspection apparatus

 #24
20160377425
2016-12-29

Determining multi-patterning step overlay error

 #25
20160013017
2016-01-14

Method and apparatus for a high resolution imaging system

 #26
20150102236
2015-04-16

Electron beam exposure apparatus and method of detecting error using the same

 #27
20150090896
2015-04-02

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

 #28
20150041672
2015-02-12

Multi charged particle beam writing method, and multi charged particle beam writing apparatus

 #29
20130115723
2013-05-09

Method of manufacturing semiconductor device

 #30
20120273686
2012-11-01

Apparatus and methods for electron beam detection

 #31
20100306721
2010-12-02

Write error verification method of writing apparatus and creation apparatus of write error verification data for writing apparatus

 #32
20070103659
2007-05-10

Writing method and writing apparatus of charged particle beam, positional deviation measuring method, and position measuring apparatus

 #33
20060060781
2006-03-23

Charged-particle beam apparatus and method for automatically correcting astigmatism and for height detection

 #34
20050279934
2005-12-22

Charged particle beam system