206987 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Preparing wafers; Preparing bulk and homogeneous wafers; Multistep processes; Specific process step Mirror polishing
Chemical mechanical polishing of silicon carbide comprising surfaces
#302Method of processing a surface of group III nitride crystal and group III nitride crystal substrate
#303Chemical mechanical planarization using nanodiamond
#304METHOD OF SURFACE TREATMENT OF GROUP III NITRIDE CRYSTAL FILM, GROUP III NITRIDE CRYSTAL SUBSTRATE, GROUP III NITRIDE CRYSTAL SUBSTRATE WITH EPITAXIAL LAYER, AND SEMICONDUCTOR DEVICE
#305Group III nitride substrate, epitaxial layer-provided substrate, methods of manufacturing the same, and method of manufacturing semiconductor device
#306SYSTEMS, METHODS AND SLURRIES FOR CHEMICAL-MECHANICAL ROUGH POLISHING OF GAAS WAFERS
#307Systems, methods and solutions for chemical polishing of GaAs wafers
#308Polishing composition for semiconductor wafer
#309COMPOSITION COMPRISING CHELATING AGENTS CONTAINING AMIDOXIME COMPOUNDS
#310WATER-BASED POLISHING SLURRY FOR POLISHING SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE, AND POLISHING METHOD FOR THE SAME
#311Final polishing method for silicon single crystal wafer and silicon single crystal wafer
#312METHODS FOR POLISHING ALUMINUM NITRIDE
#313Method for polishing a semiconductor wafer
#314Method for producing a semiconductor wafer
#315Additive for polishing composition
#316Process for smoothening III-N substrates
#317Wetting agent for semiconductors, and polishing composition and polishing method employing it
#318Method for manufacturing silicon wafer
#319POLISHING COMPOSITION FOR SILICON WAFER, POLISHING COMPOSITION KIT FOR SILICON WAFER AND METHOD OF POLISHING SILICON WAFER
#320Method of polishing silicon wafer
#321Stable, high rate silicon slurry
#322Thin silicon wafer with high gettering ability and production method thereof
#323Group III nitride crystal and method for surface treatment thereof, group III nitride stack and manufacturing method thereof, and group III nitride semiconductor device and manufacturing method thereof
#324Nitride semiconductor wafer and method of processing nitride semiconductor wafer
#325Polishing process for producing damage free surfaces on semi-insulating silicon carbide wafers
#326POLISHING SLURRY, METHOD OF TREATING SURFACE OF GAXIN1-XASYP1-Y CRYSTAL AND GAXIN1-XASYP1-Y CRYSTAL SUBSTRATE
#327Polishing Composition and Polishing Method Using The Same
#328APPARATUS AND METHOD OF MANUFACTURING AN INTEGRATED CIRCUIT
#329Polishing Composition and Polishing Method
#330Method For Producing A Semiconductor Wafer With A Polished Edge
#331Polishing Composition for Silicon Wafer
#332Double-side polishing method for wafer
#333Method for manufacturing silicon carbide semiconductor apparatus
#334WAFER MANUFACTURING METHOD, POLISHING APPARATUS, AND WAFER
#335Substrate, method of polishing the same, and polishing apparatus
#336GaN SUBSTRATE AND SEMICONDUCTOR DEVICE PREPARED BY USING METHOD AND APPARATUS OF POLISHING GaN SUBSTRATE
#337Rough polishing method of semiconductor wafer and polishing apparatus of semiconductor wafer
#338Method for polishing a substrate composed of semiconductor material
#339Method of manufacturing semiconductor device including silicon carbide substrate
#340Polishing composition for semiconductor wafer and polishing method
#341Method of polishing compound semiconductor substrate, compound semiconductor substrate, method of manufacturing compound semiconductor epitaxial substrate, and compound semiconductor epitaxial substrate
#342Semiconductor Polishing Composition
#343Chemical-Mechanical Polishing of Sic Surfaces Using Hydrogen Peroxide or Ozonated Water Solutions in Combination with Colloidal Abrasive
#344Composition for polishing semiconductor wafer, and method of producing the same
#345Mechano-chemical polishing method for GaAs wafer
#346III-V compound semiconductor substrate manufacturing method
#347Polishing composition and polishing method using the same
#348Methods for producing smooth wafers
#349SILICON CARBIDE POLISHING METHOD UTILIZING WATER-SOLUBLE OXIDIZERS
#350Silicon carbide polishing method utilizing water-soluble oxidizers
#351Method of polishing hard crystal substrate
#352Method for manufacturing silicon wafer
#353METHODS OF RECYCLING A SUBSTRATE INCLUDING USING A CHEMICAL MECHANICAL POLISHING PROCESS
#354Polishing Composition For Silicon Wafer
#355Polishing method and polishing device
#356Polishing Composition and Polishing Method
#357Rough polishing method of semiconductor wafer and polishing apparatus of semiconductor wafer
#358Method For Polishing A Semiconductor Wafer And Polished Semiconductor Wafer Producible According To The Method
#359Silicon carbide polishing method utilizing water-soluble oxidizers
#360Epitaxial wafer and method of producing same
#361Polishing composition and polishing method
#362Method for manufacturing semiconductor device utilizing recrystallized semiconductor film formed on an insulating film
#363Method for Polishing Silicon Wafer, Method for Producing Silicon Wafer, Apparatus for Polishing Disk-Shaped Workpiece, and Silicon Wafer
#364Process for smoothening III-N substrates
#365Bipolar Semiconductor Device and Process for Producing the Same
#366Method for polishing a substrate surface
#367Surface treatment method for nitride crystal, nitride crystal substrate, nitride crystal substrate with epitaxial layer and semiconductor device, and method of manufacturing nitride crystal substrate with epitaxial layer and semiconductor device
#368Silicon carbide semiconductor device
#369GaN crystal substrate and method of manufacturing the same, and method of manufacturing semiconductor device
#370Method of processing a surface of group III nitride crystal and group III nitride crystal substrate
#371Semiconductor surface processing
#372Polishing agent
#373Method of manufacturing semiconductor substrate and method of evaluating quality of semiconductor substrate
#374WAFER REMOVING FORCE REDUCTION ON CMP TOOL
#375Polishing composition and rinse composition
#376POLISHING COMPOSITION AND RINSE COMPOSITION
#377Method for manufacturing single-side mirror surface wafer
#378Polishing slurries
#379Polishing slurry, method of treating surface of GaInAsPcrystal and GaInAsPcrystal substrate
#380Polishing method for semiconductor wafer
#381Polar surface preparation of nitride substrates
#382Method of polishing GaN substrate
#383Semiconductor substrate, method for fabricating the same, and method for fabricating semiconductor device
#384Wafer polishing apparatus and method for polishing wafers
#385Method for polishing wafer
#386Method of surface treatment of group III nitride crystal film, group III nitride crystal substrate, group III nitride crystal substrate with epitaxial layer, and semiconductor device
#387Three inch silicon carbide wafer with low warp, bow, and TTV
#388Polishing slurry composition and method of using the same
#389Method for manufacturing semiconductor device, integrated circuit, electrooptics device, and electronic apparatus
#390Cerium oxide abrasive and method of polishing substrates
#391Polishing composition and rinsing composition
#392CERIUM OXIDE ABRASIVE AND METHOD OF POLISHING SUBSTRATES
#393Polishing process for producing damage free surfaces on semi-insulating silicon carbide wafers
#394Polishing composition
#395Wafer polishing method and apparatus
#396Polishing composition and polishing method using the same
#397Polishing liquid
#398Method for polishing silicon carbide crystal substrate
#399High surface quality GaN wafer and method of fabricating same
#400Method for controlling pH during planarization and cleaning of microelectronic substrates
#401System and methods for polishing a wafer
#402Silicon carbide semiconductor device and method for manufacturing the same
#403Polishing composition and polishing method
#404Nitride semiconductor wafer and method of processing nitride semiconductor wafer
#405Method of processing substrate
#406Cerium oxide abrasive and method of polishing substrates
#407Method for manufacturing SiC substrate
#408Method of preparing a surface of a semiconductor wafer to make it epiready
#409Method and pad for polishing wafer
#410Method for creating asymmetrical wafer
#411Extrinsic gettering on semiconductor devices