Patents-Review.com
ClassID:

206987 ⎘

H01L21/02024 - CPC Classification

Classification description:

Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Preparing wafers; Preparing bulk and homogeneous wafers; Multistep processes; Specific process step Mirror polishing

Recent Application in this class:
#1
20250125141
2025-04-17

EPITAXIAL WAFER AND A METHOD FOR MANUFACTURING AN EPITAXIAL WAFER

 #2
20250075103
2025-03-06

SLURRY SOLUTION, METHOD FOR FABRICATING THE SLURRY SOLUTION, AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SLURRY SOLUTION

 #3
20250062148
2025-02-20

AUTOMATED SEMICONDUCTOR SUBSTRATE POLISHING AND CLEANING METHODS

 #4
20240387162
2024-11-21

METHOD FOR WAFER BACKSIDE POLISHING

 #5
20240278381
2024-08-22

POLISHING HEAD, POLISHING DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR WAFER

 #6
20240242960
2024-07-18

INFORMATION PROCESSING DEVICE AND INFORMATION PROCESSING METHOD

 #7
20240241064
2024-07-18

METHOD FOR EVALUATING WORK-MODIFIED LAYER, AND METHOD OF MANUFACTURING SEMICONDUCTOR SINGLE CRYSTAL SUBSTRATE

 #8
20240203745
2024-06-20

SILICON WAFER MANUFACTURING METHOD

 #9
20240145254
2024-05-02

CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

 #10
20240120192
2024-04-11

METHOD OF CLEANING SILICON WAFER, METHOD OF MANUFACTURING SILICON WAFER, AND SILICON WAFER

 #11
20240055264
2024-02-15

WAFER POLISHING METHOD AND WAFER PRODUCING METHOD

 #12
20240018390
2024-01-18

POLISHING COMPOSITION

 #13
20230392289
2023-12-07

INDIUM PHOSPHIDE SUBSTRATE, METHOD FOR MANUFACTURING INDIUM PHOSPHIDE SUBSTRATE, AND SEMICONDUCTOR EPITAXIAL WAFER

 #14
20230378274
2023-11-23

INDIUM PHOSPHIDE SUBSTRATE, METHOD FOR MANUFACTURING INDIUM PHOSPHIDE SUBSTRATE, AND SEMICONDUCTOR EPITAXIAL WAFER

 #15
20230347469
2023-11-02

SEMICONDUCTOR WAFER THERMAL REMOVAL CONTROL

 #16
20230197455
2023-06-22

METHODS FOR POLISHING SEMICONDUCTOR SUBSTRATES

 #17
20230173633
2023-06-08

MANUFACTURING METHOD FOR A SUBSTRATE WAFER

 #18
20230137813
2023-05-04

METHOD AND APPARATUS FOR POLISHING WAFER

 #19
20230136485
2023-05-04

POLISHING COMPOSITION

 #20
20230125000
2023-04-20

METHOD FOR MEASURING DIC DEFECT SHAPE ON SILICON WAFER AND POLISHING METHOD

 #21
20230075359
2023-03-09

INSPECTING APPARATUS, PEELING APPARATUS, AND LEARNED MODEL GENERATING METHOD

 #22
20230064958
2023-03-02

Method for wafer backside polishing

 #23
20230052218
2023-02-16

METHOD OF SiC WAFER PROCESSING

 #24
20230033545
2023-02-02

Method of transferring semiconductor wafer to polishing apparatus and method of producing semiconductor wafer

 #25
20220364267
2022-11-17

Group III nitride single crystal substrate and method for production thereof

 #26
20220336203
2022-10-20

FABRICATION METHOD OF SEMICONDUCTOR SUBSTRATE

 #27
20220316092
2022-10-06

Indium phosphide substrate, semiconductor epitaxial wafer, and method for producing indium phosphide substrate

 #28
20220223402
2022-07-14

Method of CMP integration for improved optical uniformity in advanced LCOS back-plane

 #29
20220220638
2022-07-14

Silicon carbide substrate

 #30
20220220637
2022-07-14

Silicon carbide substrate

 #31
20220208549
2022-06-30

Indium phosphide substrate

 #32
20220199770
2022-06-23

INDIUM PHOSPHIDE SUBSTRATE AND METHOD FOR PRODUCING INDIUM PHOSPHIDE SUBSTRATE

 #33
20220189883
2022-06-16

INDIUM PHOSPHIDE SUBSTRATE AND METHOD FOR PRODUCING INDIUM PHOSPHIDE SUBSTRATE

 #34
20220162477
2022-05-26

POLISHING COMPOSITION

 #35
20220115226
2022-04-14

Manufacture method of a high-resistivity silicon handle wafer for a hybrid substrate structure

 #36
20220102225
2022-03-31

Semiconductor wafer evaluation method and manufacturing method and semiconductor wafer manufacturing process management method

 #37
20220097200
2022-03-31

Wafer manufacturing method and wafer

 #38
20220028969
2022-01-27

Silicon epitaxial wafer production method and silicon epitaxial wafer

 #39
20220028718
2022-01-27

Automated semiconductor substrate polishing and cleaning

 #40
20220028698
2022-01-27

METHOD FOR MAKING SEMICONDUCTOR SUBSTRATE AND METHOD FOR MAKING SEMICONDUCTOR DEVICE

 #41
20210382334
2021-12-09

Optical adjustable filter sub-assembly

 #42
20210375782
2021-12-02

Method of producing laser-marked silicon wafer and laser-marked silicon wafer

 #43
20210324238
2021-10-21

Hard abrasive particle-free polishing of hard materials

 #44
20210301421
2021-09-30

SiC wafer and manufacturing method for SiC wafer

 #45
20210245321
2021-08-12

Apparatus and method for double-side polishing work

 #46
20210178547
2021-06-17

Semiconductor wafer thermal removal control

 #47
20210013092
2021-01-14

Semiconductor substrate polishing methods

 #48
20200381243
2020-12-03

Wafer production method

 #49
20200347514
2020-11-05

Laminate of aluminum nitride single-crystal substrate

 #50
20200335350
2020-10-22

Method and equipment for performing CMP process

 #51
20200258735
2020-08-13

WAFER POLISHING METHOD AND APPARATUS

 #52
20200239727
2020-07-30

Surface protectant for semiconductor wafer

 #53
20200185215
2020-06-11

Method of double-side polishing silicon wafer

 #54
20200176305
2020-06-04

Group III nitride composite substrate and method for manufacturing the same, and method for manufacturing group III nitride semiconductor device

 #55
20200168451
2020-05-28

Processing method for wafer

 #56
20200147749
2020-05-14

Method for polishing using polishing pad provided with adsorption layer

 #57
20200126876
2020-04-23

Method, control system and plant for processing a semiconductor wafer, and semiconductor wafer

 #58
20200102479
2020-04-02

HARD ABRASIVE PARTICLE-FREE POLISHING OF HARD MATERIALS METHOD

 #59
20200090923
2020-03-19

Wafer surface beveling method, method of manufacturing wafer, and wafer

 #60
20200083057
2020-03-12

Methods for polishing semiconductor substrates that adjust for pad-to-pad variance

 #61
20200041247
2020-02-06

Indium phosphide substrate, method of inspecting indium phosphide substrate, and method of producing indium phosphide substrate

 #62
20200039021
2020-02-06

Method of double-side polishing semiconductor wafer

 #63
20200006047
2020-01-02

Method for manufacturing wafer

 #64
20190337116
2019-11-07

Method of using a polishing system

 #65
20190252180
2019-08-15

WAFER MANUFACTURING METHOD AND WAFER

 #66
20190221435
2019-07-18

Method of manufacturing bonded wafer

 #67
20190210186
2019-07-11

Slurry cooling device and slurry supply system having the same

 #68
20190189460
2019-06-20

Method for polishing silicon wafer and surface treatment composition

 #69
20190189421
2019-06-20

Semiconductor wafer, and method for polishing semiconductor wafer

 #70
20190181059
2019-06-13

Method for evaluating surface defects of substrate to be bonded

 #71
20190164771
2019-05-30

Method and equipment for performing CMP process

 #72
20190155066
2019-05-23

Optical adjustable filter sub-assembly

 #73
20190153278
2019-05-23

Polishing method and polishing composition

 #74
20190122904
2019-04-25

Planarizing processing method and planarizing processing device

 #75
20190115205
2019-04-18

Silicon carbide wafer and method for production thereof

 #76
20190112506
2019-04-18

Polishing composition

 #77
20190093255
2019-03-28

Method for producing aluminum nitride single crystal substrate

 #78
20190077992
2019-03-14

Polishing composition, method for producing polishing composition and polishing composition preparation kit

 #79
20190062595
2019-02-28

Polishing composition and polishing method using same

 #80
20190061095
2019-02-28

Method for polishing silicon substrate and polishing composition set

 #81
20190035675
2019-01-31

Polishing slurries for polishing semiconductor wafers

 #82
20190030676
2019-01-31

Silicon wafer single-side polishing method

 #83
20190022821
2019-01-24

Method for polishing silicon substrate and polishing composition set

 #84
20190010359
2019-01-10

Polishing slurry and polishing material

 #85
20190010356
2019-01-10

Hard abrasive particle-free polishing of hard materials

 #86
20180361530
2018-12-20

Double-side polishing method and double-side polishing apparatus

 #87
20180355212
2018-12-13

Polishing composition, method for producing same, and polishing method

 #88
20180342383
2018-11-29

Monocrystalline semiconductor wafer and method for producing a semiconductor wafer

 #89
20180340095
2018-11-29

Oxidizing fluid for the chemical-mechanical polishing of ceramic materials

 #90
20180312725
2018-11-01

Polishing composition

 #91
20180308697
2018-10-25

Semiconductor substrate and manufacturing method of the same

 #92
20180305580
2018-10-25

Polishing composition

 #93
20180304437
2018-10-25

Methods and systems for polishing pad control

 #94
20180304436
2018-10-25

Methods and systems for polishing pad control

 #95
20180274129
2018-09-27

Silicon carbide substrate

 #96
20180272497
2018-09-27

Method for double-side polishing wafer

 #97
20180245240
2018-08-30

METHOD FOR PRODUCING SEMICONDUCTOR EPITAXIAL WAFER AND SEMICONDUCTOR EPITAXIAL WAFER

 #98
20180226263
2018-08-09

Method and apparatus for within-wafer profile localized tuning

 #99
20180226258
2018-08-09

Method for manufacturing semiconductor wafer

 #100
20180218916
2018-08-02

Surface machining method for single crystal SiC substrate, manufacturing method thereof, and grinding plate for surface machining single crystal SiC substrate

 #101
20180190774
2018-07-05

DIAMOND SUBSTRATE AND METHOD FOR PRODUCING THE SAME

 #102
20180174834
2018-06-21

Method of preparing diamond substrates for CVD nanometric delta doping

 #103
20180138097
2018-05-17

Sizing device, polishing apparatus, and polishing method

 #104
20180068850
2018-03-08

CVD reactor and method for nanometric delta doping of diamond

 #105
20180066161
2018-03-08

Polishing composition for silicon wafer and polishing method

 #106
20180038010
2018-02-08

Method for manufacturing group-III nitride semiconductor crystal substrate

 #107
20180009081
2018-01-11

Turntable cloth peeling jig

 #108
20170363406
2017-12-21

Indium phosphide substrate, method of inspecting indium phosphide substrate, and method of producing indium phosphide substrate

 #109
20170355060
2017-12-14

Wafer polishing apparatus and wafer polishing method using same

 #110
20170345663
2017-11-30

Method for manufacturing a bonded SOI wafer

 #111
20170342298
2017-11-30

Single crystal silicon-carbide substrate and polishing solution

 #112
20170338158
2017-11-23

Method of evaluating gettering property

 #113
20170330783
2017-11-16

Vacuum chuck, beveling/polishing device, and silicon wafer beveling/polishing method

 #114
20170330763
2017-11-16

Semiconductor treatment composition and treatment method

 #115
20170330762
2017-11-16

SEMICONDUCTOR TREATMENT COMPOSITION AND TREATMENT METHOD

 #116
20170321098
2017-11-09

Polishing composition

 #117
20170320187
2017-11-09

Polishing method and polishing composition

 #118
20170312881
2017-11-02

Polishing system

 #119
20170301533
2017-10-19

Method for processing semiconductor wafer, method for manufacturing bonded wafer, and method for manufacturing epitaxial wafer

 #120
20170283987
2017-10-05

Single-crystal silicon-carbide substrate and polishing solution

 #121
20170260650
2017-09-14

Cleaning method and laminate of aluminum nitride single-crystal substrate

 #122
20170256439
2017-09-07

Semiconductor substrate polishing methods and slurries and methods for manufacturing silicon on insulator structures

 #123
20170253767
2017-09-07

Silicon wafer polishing composition

 #124
20170236718
2017-08-17

Method of polishing group III-V materials

 #125
20170178926
2017-06-22

Polishing composition and polishing method

 #126
20170178919
2017-06-22

Surface machining method for single crystal SiC substrate, manufacturing method thereof, and grinding plate for surface machining single crystal SiC substrate

 #127
20170178890
2017-06-22

Semiconductor substrate polishing methods with dynamic control

 #128
20170178888
2017-06-22

Method for polishing semiconductor substrate

 #129
20170175053
2017-06-22

Polishing composition

 #130
20170174940
2017-06-22

Polishing composition

 #131
20170174939
2017-06-22

Polishing composition

 #132
20170158911
2017-06-08

Halite salts as silicon carbide etchants for enhancing CMP material removal rate for SiC wafer

 #133
20170136596
2017-05-18

Workpiece double-disc grinding method

 #134
20170110378
2017-04-20

Method for estimating depth of latent scratches in SiC substrates

 #135
20170100815
2017-04-13

Method for polishing GaN single crystal material

 #136
20170098559
2017-04-06

Planarizing processing method and planarizing processing device

 #137
20170081554
2017-03-23

Composition for polishing silicon wafers

 #138
20170081553
2017-03-23

POLISHING COMPOSITION

 #139
20170062268
2017-03-02

SOI wafer manufacturing process and SOI wafer

 #140
20170053826
2017-02-23

Semiconductor substrate polishing methods and slurries and methods for manufacturing silicon on insulator structures

 #141
20170037278
2017-02-09

Slurry composition and method for polishing substrate

 #142
20170029977
2017-02-02

Method for producing semiconductor epitaxial wafer and semiconductor epitaxial wafer

 #143
20170014970
2017-01-19

Polishing pad and process for producing same

 #144
20170011903
2017-01-12

Method for manufacturing semiconductor wafer

 #145
20170001281
2017-01-05

Methods and systems for polishing pad control

 #146
20160343808
2016-11-24

Silicon carbide substrate, semiconductor device, and methods for manufacturing them

 #147
20160332278
2016-11-17

Polishing apparatus for a work with mechanical polishing function and chemical polishing function

 #148
20160325398
2016-11-10

Polishing abrasive particle, production method therefore, polishing method, polishing device, and slurry

 #149
20160300910
2016-10-13

Silicon carbide semiconductor substrate used to form semiconductor epitaxial layer thereon

 #150
20160272846
2016-09-22

Polishing composition, method for producing polishing composition and polishing composition preparation kit

 #151
20160222265
2016-08-04

Abrasive material, method for producing same, and abrasive slurry containing same

 #152
20160218003
2016-07-28

Single-crystal silicon carbide substrate, method for producing single-crystal silicon carbide substrate, and method for inspecting single-crystal silicon carbide substrate

 #153
20160217998
2016-07-28

Method for producing mirror-polished wafer

 #154
20160215189
2016-07-28

Polishing composition and method for producing same

 #155
20160215188
2016-07-28

Polishing composition and method for producing same

 #156
20160214230
2016-07-28

Apparatus for dressing urethane foam pad for use in polishing

 #157
20160207161
2016-07-21

Method of polishing wafer and wafer polishing apparatus

 #158
20160196966
2016-07-07

Method and device for polishing semiconductor wafer

 #159
20160189973
2016-06-30

Method for producing polished object and polishing composition kit

 #160
20160167193
2016-06-16

Metallic abrasive pad and method for manufacturing same

 #161
20160133466
2016-05-12

Method of polishing SiC substrate

 #162
20160096979
2016-04-07

Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material

 #163
20160068712
2016-03-10

Chemical-mechanical polishing compositions comprising polyethylene imine

 #164
20160060488
2016-03-03

Polishing of hard substrates with soft-core composite particles

 #165
20160035579
2016-02-04

Surface machining method for single crystal SiC substrate, manufacturing method thereof, and grinding plate for surface machining single crystal SiC substrate

 #166
20160020281
2016-01-21

Silicon carbide substrate, semiconductor device, and methods for manufacturing them

 #167
20160001416
2016-01-07

Polishing composition and method for producing polished article

 #168
20150311097
2015-10-29

Polishing apparatus and polishing method

 #169
20150303050
2015-10-22

Method for producing SiC substrate

 #170
20150299517
2015-10-22

Polishing composition

 #171
20150262833
2015-09-17

Method for polishing work and work polishing apparatus

 #172
20150217425
2015-08-06

Double-side polishing method

 #173
20150214123
2015-07-30

Semiconductor wafer evaluation method and semiconductor wafer manufacturing method

 #174
20150210892
2015-07-30

Polishing composition and method for producing substrate

 #175
20150210891
2015-07-30

Polishing composition, method for manufacturing polishing composition, and method for manufacturing polishing composition liquid concentrate

 #176
20150209931
2015-07-30

Double-side polishing method

 #177
20150194318
2015-07-09

Systems and methods for performing chemical mechanical planarization

 #178
20150175845
2015-06-25

Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (CMP) of III-V material in the presence of a CMP composition comprising a specific non-ionic surfactant

 #179
20150162181
2015-06-11

Semiconductor wafer manufacturing method

 #180
20150155181
2015-06-04

Chemical mechanical planarization using nanodiamond

 #181
20150147942
2015-05-28

Method of double-side polishing wafer

 #182
20150137319
2015-05-21

III nitride semiconductor substrate, epitaxial substrate, and semiconductor device

 #183
20150123027
2015-05-07

Polishing liquid composition for wafers

 #184
20150093900
2015-04-02

Chemical mechanical polishing composition for polishing silicon wafers and related methods

 #185
20150084065
2015-03-26

SiC single crystal substrate

 #186
20150083962
2015-03-26

Polishing composition and polishing method using the same

 #187
20150079789
2015-03-19

Abrasive composition and method for producing semiconductor substrate

 #188
20150069016
2015-03-12

Polishing composition

 #189
20150056122
2015-02-26

Polishing composition, manufacturing process therefor, process for production of silicon substrate, and silicon substrate

 #190
20150050862
2015-02-19

Polishing composition and method using said polishing composition to manufacture compound semiconductor substrate

 #191
20150045264
2015-02-12

Silicon wafer processing solution and silicon wafer processing method

 #192
20150031271
2015-01-29

Double-side polishing apparatus

 #193
20150028254
2015-01-29

Composition and method for polishing bulk silicon

 #194
20150017890
2015-01-15

Polishing head and polishing apparatus

 #195
20150017786
2015-01-15

Method for treating group III nitride substrate and method for manufacturing epitaxial substrate

 #196
20140342640
2014-11-20

Polishing apparatus and polishing method

 #197
20140302752
2014-10-09

Composition for polishing purposes, polishing method using same, and method for producing substrate

 #198
20140256227
2014-09-11

Double-side polishing method

 #199
20140242750
2014-08-28

Polishing slurry and polishing method

 #200
20140206261
2014-07-24

Method for polishing a semiconductor wafer

 #201
20140175461
2014-06-26

SIC epitaxial wafer and method for manufacturing same

 #202
20140170852
2014-06-19

Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or SiGematerial in the presence of a CMP composition comprising a specific organic compound

 #203
20140162534
2014-06-12

Polishing system and polishing method

 #204
20140162456
2014-06-12

METHOD FOR POLISHING SILICON WAFER AND POLISHING AGENT

 #205
20140141613
2014-05-22

PROCESS FOR POLISHING A SEMICONDUCTOR WAFER, COMPRISING THE SIMULTANEOUS POLISHING OF A FRONT SIDE AND OF A REVERSE SIDE OF A SUBSTRATE WAFER

 #206
20140117380
2014-05-01

Flat SiC semiconductor substrate

 #207
20140103492
2014-04-17

Silicon wafer and method for producing the same

 #208
20140094032
2014-04-03

Polishing agent and polishing method

 #209
20140073226
2014-03-13

Polypyrrolidone polishing composition and method

 #210
20140057438
2014-02-27

Polishing method of non-oxide single-crystal substrate

 #211
20140038413
2014-02-06

Method of manufacturing a semiconductor device including a dielectric structure

 #212
20140030957
2014-01-30

Method for adjusting height position of polishing head and method for polishing workpiece

 #213
20140008768
2014-01-09

Semiconductor wafer and manufacturing method thereof

 #214
20130324015
2013-12-05

Polishing composition

 #215
20130316521
2013-11-28

Method for producing silicon wafer

 #216
20130260650
2013-10-03

Composition for polishing and method of polishing semiconductor substrate using same

 #217
20130256700
2013-10-03

Silicon carbide substrate, semiconductor device, and methods for manufacturing them

 #218
20130234162
2013-09-12

Smoothing method for semiconductor material and wafers produced by same

 #219
20130205682
2013-08-15

Polishing composition

 #220
20130196513
2013-08-01

Method of processing surface of high-performance materials which are difficult to process

 #221
20130183826
2013-07-18

Composition for polishing and composition for rinsing

 #222
20130181159
2013-07-18

Surface treatment composition and surface treatment method using same

 #223
20130099252
2013-04-25

METHOD OF MANUFACTURING SILICON CARBIDE SUBSTRATE AND SILICON CARBIDE SUBSTRATE

 #224
20130075867
2013-03-28

Group III nitride crystal substrate

 #225
20130061841
2013-03-14

SAW WIRE AND METHOD OF MANUFACTURING GROUP III NITRIDE CRYSTAL SUBSTRATE USING THE SAME

 #226
20130040461
2013-02-14

Polishing composition and polishing method

 #227
20130032573
2013-02-07

Method for polishing silicon wafer and polishing liquid therefor

 #228
20130017763
2013-01-17

Wafer polishing method

 #229
20130012102
2013-01-10

POLISHING SLURRY AND POLISHING METHOD THEREFOR

 #230
20120315739
2012-12-13

MANUFACTURING METHOD FOR SEMICONDUCTOR WAFER

 #231
20120295443
2012-11-22

METHOD FOR RECLAIMING SEMICONDUCTOR WAFER AND POLISHING COMPOSITION

 #232
20120289129
2012-11-15

Polishing head and polishing apparatus

 #233
20120252213
2012-10-04

Chemical mechanical polishing of group III-nitride surfaces

 #234
20120248578
2012-10-04

Semiconductor wafer and method of producing the same

 #235
20120244649
2012-09-27

Polishing method, polishing apparatus and polishing tool

 #236
20120240479
2012-09-27

POLISHING SLURRY FOR SILICON CARBIDE AND POLISHING METHOD THEREFOR

 #237
20120223417
2012-09-06

GROUP III NITRIDE CRYSTAL SUBSTRATE, EPILAYER-CONTAINING GROUP III NITRIDE CRYSTAL SUBSTRATE, SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

 #238
20120193573
2012-08-02

Additive for polishing composition

 #239
20120190199
2012-07-26

Silicon polishing compositions with improved PSD performance

 #240
20120178238
2012-07-12

Manufacturing method of SOI substrate

 #241
20120164833
2012-06-28

Polishing agent, compound semiconductor manufacturing method, and semiconductor device manufacturing method

 #242
20120156970
2012-06-21

Method for the simultaneous material-removing processing of both sides of at least three semiconductor wafers

 #243
20120156878
2012-06-21

Method for producing epitaxial silicon wafer

 #244
20120152278
2012-06-21

Method for cleaning a semiconductor wafer composed of silicon directly after a process of polishing of the semiconductor wafer

 #245
20120149198
2012-06-14

Method for producing a semiconductor wafer

 #246
20120138851
2012-06-07

POLISHING COMPOSITION AND POLISHING METHOD

 #247
20120128892
2012-05-24

SURFACE PROCESSING METHOD AND SURFACE PROCESSING APPARATUS

 #248
20120108064
2012-05-03

Polishing composition for silicon wafers

 #249
20120104558
2012-05-03

Group III nitride semiconductor substrate having a sulfide in a surface layer

 #250
20120100783
2012-04-26

Polishing pad, manufacturing method thereof and polishing method

 #251
20120094473
2012-04-19

GROUP III NITRIDE SUBSTRATE, EPITAXIAL LAYER-PROVIDED SUBSTRATE, METHODS OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

 #252
20120080775
2012-04-05

Method of polishing a silicon wafer

 #253
20120070991
2012-03-22

Chemical mechanical polishing of silicon carbide comprising surfaces

 #254
20120058642
2012-03-08

Silicon polishing compositions with high rate and low defectivity

 #255
20120034850
2012-02-09

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