ClassID:

208272

H01L29/154 - CPC Classification

Classification description:

Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor; Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed; Structures with periodic or quasi periodic potential variation, e.g. multiple quantum wells, superlattices; Compositional structures with quantum effects only in vertical direction, i.e. layered structures with quantum effects solely resulting from vertical potential variation comprising at least one long range structurally disordered material, e.g. one-dimensional vertical amorphous superlattices

Recent Application in this class:
#1
20250056871
2025-02-13

METHODS OF FORMING BOTTOM DIELECTRIC ISOLATION LAYERS

#2
20240371943
2024-11-07

SEMICONDUCTOR DEVICES INCLUDING LOCALIZED SEMICONDUCTOR-ON-INSULATOR (SOI) REGIONS

#3
20230067331
2023-03-02

SOURCE DRAIN FORMATION IN GATE ALL AROUND TRANSISTOR

#4
20230051827
2023-02-16

Semiconductor Structures

#5
20230037719
2023-02-09

Methods of forming bottom dielectric isolation layers

#6
20200411645
2020-12-31

Method for making superlattice structures with reduced defect densities

#7
20200075731
2020-03-05

Method for making superlattice structures with reduced defect densities

#8
20190348536
2019-11-14

Cascade tunneling field effect transistors

#9
20180337041
2018-11-22

NITRIDE SEMICONDUCTOR ELEMENT AND NITRIDE SEMICONDUCTOR PACKAGE

#10
20180158678
2018-06-07

Nitride semiconductor element and nitride semiconductor package

#11
20180047813
2018-02-15

Methods of forming substrate structures and semiconductor components

#12
20170301757
2017-10-19

Semiconductor device including a superlattice and replacement metal gate structure and related methods

#13
20170271454
2017-09-21

Substrate structure, semiconductor component and method

#14
20170011911
2017-01-12

Nitride semiconductor element and nitride semiconductor package

#15
20160247968
2016-08-25

Nitride semiconductor wafer, nitride semiconductor element, and method for manufacturing nitride semiconductor wafer

#16
20160155807
2016-06-02

Nitride semiconductor element and nitride semiconductor package

#17
20140302310
2014-10-09

AMORPHOUS MULTI-COMPONENT METAL/METAL OXIDE NANOLAMINATE METAMATERIALS AND DEVICES BASED THEREON

#18
20140158984
2014-06-12

SEMICONDUCTOR STRUCTURE

#19
20120119219
2012-05-17

Nitride semiconductor element and nitride semiconductor package

#20
20080179588
2008-07-31

Semiconductor device including a metal-to-semiconductor superlattice interface layer and related methods

#21
20050170590
2005-08-04

Method for making a semiconductor device including a superlattice with regions defining a semiconductor junction