ClassID:

208380

H01L29/66083 - CPC Classification

Classification description:

Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor; Types of semiconductor device ; Multistep manufacturing processes therefor; Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by variation of the electric current supplied or the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. two-terminal devices

Sub-classes:
Recent Application in this class:
#1
20250040157
2025-01-30

Metal-Oxide-Semiconductor Capacitors and Methods of Fabricating The Same

#2
20250031391
2025-01-23

SEMICONDUCTOR DEVICE WITH PROGRAMMABLE INSULATING LAYER AND METHOD FOR FABRICATING THE SAME

#3
20250031390
2025-01-23

SEMICONDUCTOR DEVICE WITH PROGRAMMABLE INSULATING LAYER AND METHOD FOR FABRICATING THE SAME

#4
20230178590
2023-06-08

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#5
20230127474
2023-04-27

Semiconductor device and operation method thereof

#6
20230057209
2023-02-23

Terahertz oscillator and producing method thereof

#7
20230054171
2023-02-23

Ferroelectric tunnel junction devices with internal biases for long retention

#8
20220392908
2022-12-08

Ferroelectric-assisted tunneling selector device

#9
20220109074
2022-04-07

Ferroelectric-assisted tunneling selector device

#10
20210273095
2021-09-02

Power semiconductor devices with low specific on-resistance

#11
20200365591
2020-11-19

Semiconductor device and operation method thereof

#12
20200044097
2020-02-06

Voltage-controllable capacitor comprising a ferroelectric layer and method for producing the voltage-controllable capacitor comprising a ferroelectric layer

#13
20190214506
2019-07-11

Complementary metal-oxide-semiconductor (CMOS) voltage-controlled resistor

#14
20150179733
2015-06-25

Schottky diode with buried layer in GaN materials

#15
20150001650
2015-01-01

Semiconductor pressure sensor device and method of manufacturing the same

#16
20130161792
2013-06-27

Semiconductor device having trench capacitor structure integrated therein

#17
20130102134
2013-04-25

Method for producing silicon nanowire devices

#18
20130087879
2013-04-11

Schottky diode with buried layer in GaN materials

#19
20130087835
2013-04-11

Method and system for floating guard rings in gallium nitride materials

#20
20110059609
2011-03-10

Fabrication method of two-terminal semiconductor component using trench technology

#21
20090267200
2009-10-29

Method for manufacturing a semiconductor substrate including laser annealing

#22
20080197399
2008-08-21

Nanotip capacitor

#23
20060158801
2006-07-20

Punch-through diode and method of processing the same