H05H1/0012 - CPC Classification Index

ClassID:

233423 ⎘

H05H1/0012 - CPC Classification

Classification description:

Generating plasma; Handling plasma; Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry

Sub-classes:

H05H1/0018 » {Details} 5
H05H1/0018 » {Details} 5
H05H1/0025 » {by using photoelectric means } 14
H05H1/0025 » {by using photoelectric means } 14
H05H1/0031 » {by interferrometry} 3
H05H1/0031 » {by interferrometry} 3
H05H1/0037 » {by spectrometry } 28
H05H1/0037 » {by spectrometry } 28
H05H1/0043 » {by using infra-red or ultra-violet radiation} 5
H05H1/0043 » {by using infra-red or ultra-violet radiation} 5
H05H1/005 » {by using X-rays or alpha rays } 0
H05H1/005 » {by using X-rays or alpha rays } 0
H05H1/0056 » {by using neutrons } 0
H05H1/0056 » {by using neutrons } 0
H05H1/0062 » {by using microwaves } 7
H05H1/0062 » {by using microwaves } 7

Recent Application in this class:

20190045617

2019-02-07

Target structure for enhanced electron screening

20160295675

2016-10-06

Unignited plasma state discrimination device and unignited plasma state discrimination method

20140231679

2014-08-21

Method and technique to control laser effects through tuning of parameters such as repetition rate

20130160523

2013-06-27

Device and use of the device for measuring the density and/or the electron temperature and/or the collision frequency of a plasma

20100090106

2010-04-15

Method and apparatus for photon-assisted evaluation of a plasma

20100006417

2010-01-14

Capacitively-coupled electrostatic (CCE) probe arrangement for detecting strike step in a plasma processing chamber and methods thereof

20080223299

2008-09-18

SYSTEM FOR DETECTING PLASMA REACTION AND METHOD FOR USING THE SAME

20050068048

2005-03-31

Beam profile monitor with accurate horizontal and vertical beam profiles