Stefan Wurm

Dense seed layer and method of formation

Passivation of multi-layer mirror for extreme ultraviolet lithography

Passivation of multi-layer mirror for extreme ultraviolet lithography

Passivation of multi-layer mirror for extreme ultraviolet lithography

Reticle Stages for Lithography Systems and Lithography Methods

Dense seed layer and method of formation

Systems and methods for in-situ reflectivity degradation monitoring of optical collectors used in extreme ultraviolet (EUV) lithography processes

Systems and methods for monitoring and controlling the operation of extreme ultraviolet (EUV) light sources used in semiconductor fabrication

EUV Lithography System and Chuck for Releasing Reticle in a Vacuum Isolated Environment

Systems and methods of measuring power in lithography systems

Fluids and methods of forming thereof

Method for determining a radiation power and an exposure apparatus

Dense seed layer and method of formation

Reticle stages for lithography systems and lithography methods

Semiconductor memory device and operating method for a semiconductor memory device

Methods of forming capping layers on reflective materials

EUV lithography filter

Photosensitive coating material for a substrate

Device for generating and/or influencing electromagnetic radiation from a plasma

Dense seed layer and method of formation

Con-focal imaging system and method using destructive interference to enhance image contrast of light scattering objects on a sample surface

Lithography mask substrate labeling system

EUV magnetic contrast lithography mask and manufacture thereof

Passivation of multi-layer mirror for extreme ultraviolet lithography

EUV lithography system and chuck for releasing reticle in a vacuum isolated environment