Tilburg
Netherlands
34
2020-06-18
The entities that hold a legal rights for patent applications filed by inventor Eurlings Markus Franciscus Antonius:
Markus Franciscus Antonius Eurlings from Tilburg, NL has applied for patents for these inventions. The list has both pending applications and granted patents:
Method of measuring a parameter of a patterning process, metrology apparatus, target
#2 | 2019-05-23Method and device for pupil illumination in overlay and critical dimension sensors
#3 | 2018-02-01Radiation source
#4 | 2017-11-02Lithographic apparatus and method
#5 | 2017-08-31Beam homogenizer, illumination system and metrology system
#6 | 2016-07-07Radiation source and lithographic apparatus
#7 | 2016-04-28Lithographic apparatus and method
#8 | 2015-11-19Beam delivery for EUV lithography
#9 | 2013-08-01Lithographic Apparatus and Device Manufacturing Method
#10 | 2013-01-03Radiation conduit for radiation source
#11 | 2012-06-14Lithographic apparatus and method
#12 | 2012-03-29Lithographic apparatus and method for reducing stray radiation
#13 | 2010-07-01Method and apparatus for performing model-based layout conversion for use with dipole illumination
#14 | 2009-07-09Lithographic apparatus and device manufacturing method
#15 | 2009-02-05Lithographic apparatus and method
#16 | 2008-10-02Lithographic apparatus and method
#17 | 2007-08-23Lithographic apparatus and device manufacturing method
#18 | 2007-03-15Optical element for use in lithography apparatus and method of conditioning radiation beam
#19 | 2007-02-22Method and apparatus for performing model-based layout conversion for use with dipole illumination
#20 | 2006-11-21Method and apparatus for performing model-based layout conversion for use with dipole illumination
#21 | 2006-11-09Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence
#22 | 2006-06-29Lithographic apparatus and device manufacturing method
#23 | 2006-05-04Lithographic apparatus and device manufacturing method
#24 | 2006-04-11Method for determining parameters for lithographic projection, a computer system and computer program therefor, a method of manufacturing a device and a device manufactured thereby
#25 | 2006-03-21Lithographic apparatus, device manufacturing method and device manufactured thereby, control system
#26 | 2006-01-12Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems
#27 | 2005-12-08Lithographic apparatus and device manufacturing method
#28 | 2005-12-08Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby
#29 | 2005-08-09Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method
#30 | 2005-07-07Lithographic apparatus and device manufacturing method
#31 | 2005-06-30Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method
#32 | 2005-06-23Device manufacturing method and mask for use therein
#33 | 2005-04-05Method of removing assist features utilized to improve process latitude
#34 | 2005-01-06Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program
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