Inventor profile of:

Tom Blomberg

City:

Vantaa

Country:

Finland

Published Applications:

19

Last publication date:

2025-08-28

Top Assignees for applications by Tom Blomberg

The entities that hold a legal rights for patent applications filed by inventor Blomberg Tom:

Recent patent applications by Blomberg Tom

Tom Blomberg from Vantaa, FI has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-08-28
US20250273463A1
Electricity

METHOD FOR FORMING DOPED METAL OXIDE FILMS ON A SUBSTRATE BY CYCLICAL DEPOSITION AND RELATED SEMICONDUCTOR DEVICE STRUCTURES

#2 | 2025-01-30
US20250037988A1
Electricity

SILICON OXIDE DEPOSITION METHOD

#3 | 2024-12-12
US20240410052A1
Chemistry; metallurgy

MULTIFUNCTIONAL COATING, METHOD OF MANUFACTURING THEREOF, RELATED COATED ITEMS AND USES

#4 | 2024-08-08
US20240261467A1
Human necessities

NANOLAMINATE COATING, RELATED COATED ITEMS AND USES, METHOD FOR IMPROVING RESISTANCE OF A SUBSTRATE TO CORROSION IN ESSENTIALLY SALINE ENVIRONMENTS, MEDICAL DEVICE

#5 | 2023-09-14
US20230290613A1
Electricity

SEMICONDUCTOR PROCESSING SYSTEM WITH GAS LINE FOR TRANSPORTING EXCITED SPECIES AND RELATED METHODS

#6 | 2023-08-17
US20230260784A1
Electricity

METHOD FOR FORMING DOPED METAL OXIDE FILMS ON A SUBSTRATE BY CYCLICAL DEPOSITION AND RELATED SEMICONDUCTOR DEVICE STRUCTURES

#7 | 2022-03-17
US20220084817A1
Electricity

Silicon oxide deposition method

#8 | 2021-11-18
US20210358721A1
Electricity

REACTOR, SYSTEM INCLUDING THE REACTOR, AND METHODS OF MANUFACTURING AND USING SAME

#9 | 2020-10-01
US20200306410A1
Human necessities

COATING FOR JOINT IMPLANTS

#10 | 2020-04-16
US20200118817A1
Electricity

Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures

#11 | 2019-09-19
US20190287769A1
Electricity

Reactor, system including the reactor, and methods of manufacturing and using same

#12 | 2018-10-04
US20180286675A1
Electricity

Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures

#13 | 2017-06-01
US20170154778A1
Electricity

SILANE AND BORANE TREATMENTS FOR TITANIUM CARBIDE FILMS

#14 | 2016-07-07
US20160196977A1
Electricity

Silane and borane treatments for titanium carbide films

#15 | 2015-06-25
US20150179440A1
Electricity

Silane and borane treatments for titanium carbide films

#16 | 2015-01-22
US20150021540A1
Electricity

Method of making a resistive random access memory device

#17 | 2015-01-22
US20150021537A1
Electricity

Method of making a resistive random access memory

#18 | 2013-11-21
US20130309417A1
Chemistry; metallurgy

Methods for forming multi-component thin films

#19 | 2012-06-28
US20120164329A1
Chemistry; metallurgy

Combination CVD/ALD method and source

InventorID:

538333 ⎘