Netherlands
33
2024-12-05
33
2025-12-30
These are the the leading inventors for applications assigned to ASM IP Holding B.V.:
ASM IP Holding B.V. based in , NL has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
ELECTRIC FIELD UNIFORMITY ON DISTRIBUTED ELECTRODE
#2 | 2024-05-02 β Patent 12,525,436 granted on 2026-01-13RF IMPEDANCE MATCHING WITH CONTINUOUS WAVE AND PULSING SOURCES
#3 | 2022-10-06 β Patent 12,100,597 granted on 2024-09-24Method and system for forming patterned structures including silicon nitride
#4 | 2021-07-08 β Patent 12,033,885 granted on 2024-07-09Channeled lift pin
#5 | 2019-06-06 β Patent 10,290,508 granted on 2019-05-14Method for forming vertical spacers for spacer-defined patterning
#6 | 2016-12-08 β Patent 9,711,350 granted on 2017-07-18Methods for semiconductor passivation by nitridation
#7 | 2016-10-20 β Patent 9,837,281 granted on 2017-12-05Cyclic doped aluminum nitride deposition
#8 | 2016-10-04 β Patent 9,461,134 granted on 2016-10-04Method for forming source/drain contact structure with chalcogen passivation
#9 | 2016-09-01 β Patent 9,514,927 granted on 2016-12-06Plasma pre-clean module and process
#10 | 2016-06-30 β Patent 9,474,163 granted on 2016-10-18Germanium oxide pre-clean module and process
#11 | 2016-05-26 β Patent 9,799,509 granted on 2017-10-24Cyclic aluminum oxynitride deposition
#12 | 2016-05-19 β Patent 9,837,271 granted on 2017-12-05Process for forming silicon-filled openings with a reduced occurrence of voids
#13 | 2016-03-17 β Patent 9,711,351 granted on 2017-07-18Process for densifying nitride film
#14 | 2016-01-21 β Patent 10,186,450 granted on 2019-01-22Apparatus and method for adjusting a pedestal assembly for a reactor
#15 | 2016-01-21 β Patent 9,443,730 granted on 2016-09-13Process for forming silicon-filled openings with a reduced occurrence of voids
#16 | 2015-12-10 β Patent 9,431,238 granted on 2016-08-30Reactive curing process for semiconductor substrates
#17 | 2015-07-30 β Patent 9,553,148 granted on 2017-01-24Method of making a wire-based semiconductor device
#18 | 2015-06-25 β Patent 9,236,247 granted on 2016-01-12Silane and borane treatments for titanium carbide films
#19 | 2015-01-22 β Patent 9,472,757 granted on 2016-10-18Method of making a resistive random access memory device
#20 | 2015-01-22 β Patent 9,520,562 granted on 2016-12-13Method of making a resistive random access memory
#21 | 2015-01-15 β Patent 9,099,423 granted on 2015-08-04Doped semiconductor films and processing
#22 | 2014-12-04 β Patent 9,552,979 granted on 2017-01-24Cyclic aluminum nitride deposition in a batch reactor
#23 | 2014-10-30 β Patent 8,956,939 granted on 2015-02-17Method of making a resistive random access memory device
#24 | 2014-10-30 β Patent 9,385,164 granted on 2016-07-05Method of making a resistive random access memory device with metal-doped resistive switching layer
#25 | 2014-09-18 β Patent 8,841,182 granted on 2014-09-23Silane and borane treatments for titanium carbide films
#26 | 2014-09-18 β Patent 8,846,550 granted on 2014-09-30Silane or borane treatment of metal thin films
#27 | 2014-05-29 β Patent 9,146,551 granted on 2015-09-29Scheduler for processing system
#28 | 2014-05-01 β Patent 9,330,899 granted on 2016-05-03Method of depositing thin film
#29 | 2014-01-30 β Patent 9,012,278 granted on 2015-04-21Method of making a wire-based semiconductor device
#30 | 2013-11-21 β Patent 9,023,427 granted on 2015-05-05Methods for forming multi-component thin films
#31 | 2013-01-10 β Patent 8,846,502 granted on 2014-09-30Methods for depositing thin films comprising gallium nitride by atomic layer deposition
#32 | 2012-12-27 β Patent 9,315,896 granted on 2016-04-19Synthesis and use of precursors for ALD of group VA element containing thin films
#33 | 2012-11-29 β Patent 8,871,617 granted on 2014-10-28Deposition and reduction of mixed metal oxide thin films
484293 β