Nuremberg
Germany
17
2023-10-05
The entities that hold a legal rights for patent applications filed by inventor Vogel Michael:
Michael Vogel from Nuremberg, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Monocrystalline SIC Substrates Having an Asymmetrical Geometry and Method of Producing Same
#2 | 2023-06-22SILICON CARBIDE SUBSTRATE AND METHOD OF GROWING SiC SINGLE CRYSTAL BOULES
#3 | 2023-04-20Method for simultaneously manufacturing more than one single crystal of a semiconductor material by physical vapor transport
#4 | 2023-03-16CHAMFERED SILICON CARBIDE SUBSTRATE AND METHOD OF CHAMFERING
#5 | 2022-03-24Silicon carbide substrate and method of growing SiC single crystal boules
#6 | 2022-01-27SiC crystals with an optimal orientation of lattice planes for fissure reduction and method of producing same
#7 | 2021-05-20Silicon carbide substrate and method of growing SiC single crystal boules
#8 | 2021-01-07System for horizontal growth of high-quality semiconductor single crystals by physical vapor transport
#9 | 2021-01-07System for efficient manufacturing of a plurality of high-quality semiconductor single crystals by physical vapor transport
#10 | 2020-08-20Production method and growth arrangement for producing a bulk SiC single crystal by arranging at least two insulation cylinder components to control a variation in a volume element density
#11 | 2020-03-05Silicon carbide substrate and method of growing SiC single crystal boules
#12 | 2019-11-14Chamfered silicon carbide substrate and method of chamfering
#13 | 2019-11-14Chamfered silicon carbide substrate and method of chamfering
#14 | 2016-03-10Method for producing a vanadium-doped silicon carbide volume monocrystal, and vanadium-doped silicon carbide substrate
#15 | 2014-08-14Monocrystalline SiC substrate with a non-homogeneous lattice plane course
#16 | 2013-11-21Physical vapor transport growth system for simultaneously growing more than one SiC single crystal and method of growing
#17 | 2011-12-08Production method for a bulk SiC single crystal with a large facet and monocrystalline SiC substrate with homogeneous resistance distribution
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