Sunnyvale, California
United States
75
2017-11-23
The entities that hold a legal rights for patent applications filed by inventor Levy Ady:
Ady Levy from Sunnyvale, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Apparatus and methods for detecting overlay errors using scatterometry
#2 | 2016-11-10Model-based hot spot monitoring
#3 | 2016-10-27Apparatus for measuring overlay errors
#4 | 2015-08-27System and method for field-by-field overlay process control using measured and estimated field parameters
#5 | 2015-04-23Small-angle scattering X-ray metrology systems and methods
#6 | 2014-10-23On-device metrology
#7 | 2014-07-17Method and system for universal target based inspection and metrology
#8 | 2013-11-28Methods and Systems for Determining a Critical Dimension and Overlay of a Specimen
#9 | 2013-04-18Acquisition of information for a construction site
#10 | 2013-04-09Measuring sheet resistance and other properties of a semiconductor
#11 | 2013-02-28Solar metrology methods and apparatus
#12 | 2013-02-14Methods and systems for determining a critical dimension and overlay of a specimen
#13 | 2012-11-08Systems and Methods for Determining One or More Characteristics of a Specimen Using Radiation in the Terahertz Range
#14 | 2012-10-11LED solar illuminator
#15 | 2011-09-20Priori crack detection in solar photovoltaic wafers by detecting bending at edges of wafers
#16 | 2011-08-02Detecting and repairing defects of photovoltaic devices
#17 | 2011-02-03Measurement and control of strained devices
#18 | 2010-11-23Measurement and control of strained devices
#19 | 2010-11-04METHODS AND SYSTEMS FOR CONTROLLING VARIATION IN DIMENSIONS OF PATTERNED FEATURES ACROSS A WAFER
#20 | 2010-10-28Methods and systems for determining a critical dimension and overlay of a specimen
#21 | 2010-09-16SYSTEMS AND METHODS FOR DETERMINING ONE OR MORE CHARACTERISTICS OF A SPECIMEN USING RADIATION IN THE TERAHERTZ RANGE
#22 | 2010-07-06Methods and systems for determining a critical dimension and overlay of a specimen
#23 | 2010-06-08Segmented optical and electrical testing for photovoltaic devices
#24 | 2010-04-15Apparatus and methods for detecting overlay errors using scatterometry
#25 | 2010-03-25Defect Detection and Response
#26 | 2010-03-25Defect detection using time delay lock-in thermography (LIT) and dark field LIT
#27 | 2009-11-26Overlay marks and methods of manufacturing such marks
#28 | 2009-11-19Apparatus and methods for detecting overlay errors using scatterometry
#29 | 2009-05-28Parametric profiling using optical spectroscopic systems
#30 | 2009-03-26Methods and systems for lithography process control
#31 | 2008-08-14Method for determining lithographic focus and exposure
#32 | 2008-06-10Apparatus and methods for detecting overlay errors using scatterometry
#33 | 2008-06-03Method for determining lithographic focus and exposure
#34 | 2008-05-27Apparatus and methods for detecting overlay errors using scatterometry
#35 | 2008-04-24Apparatus and methods for detecting overlay errors using scatterometry
#36 | 2008-03-25Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography
#37 | 2008-02-28Apparatus and methods for detecting overlay errors using scatterometry
#38 | 2008-01-31Apparatus and methods for detecting overlay errors using scatterometry
#39 | 2008-01-31Overlay marks, methods of overlay mark design and methods of overlay measurements
#40 | 2008-01-08Apparatus and methods for detecting overlay errors using scatterometry
#41 | 2007-11-27Apparatus and methods for detecting overlay errors using scatterometry
#42 | 2007-11-20Apparatus and methods for detecting overlay errors using scatterometry
#43 | 2007-10-30Apparatus and methods for detecting overlay errors using scatterometry
#44 | 2007-10-09Apparatus and methods for detecting overlay errors using scatterometry
#45 | 2007-10-09Parametric profiling using optical spectroscopic systems
#46 | 2007-07-10Apparatus and methods for detecting overlay errors using scatterometry
#47 | 2007-06-28Portable scanning electron microscope
#48 | 2007-05-17Focus masking structures, focus patterns and measurements thereof
#49 | 2007-03-27Methods and systems for determining a thin film characteristic and an electrical property of a specimen
#50 | 2007-02-20Overlay marks, methods of overlay mark design and methods of overlay measurements
#51 | 2006-11-21Methods and systems for determining a composition and a thickness of a specimen
#52 | 2006-10-31Methods and systems for determining an adhesion characteristic and a thickness of a specimen
#53 | 2006-10-26Systems and methods for mitigating variances on a patterned wafer using a prediction model
#54 | 2006-10-19Method for determining and correcting reticle variations
#55 | 2006-10-19Method for monitoring a reticle
#56 | 2006-10-19Systems and methods for modifying a reticle's optical properties
#57 | 2006-09-14Overlay marks, methods of overlay mark design and methods of overlay measurements
#58 | 2006-09-12Methods and systems for determining a presence of defects and a thin film characteristic of a specimen
#59 | 2006-08-10Overlay marks, methods of overlay mark design and methods of overlay measurements
#60 | 2006-06-29Methods and systems for controlling variation in dimensions of patterned features across a wafer
#61 | 2006-06-29Methods and systems for lithography process control
#62 | 2006-06-27Overlay marks, methods of overlay mark design and methods of overlay measurements
#63 | 2006-04-06Methods and systems for determining a presence of macro and micro defects on a specimen
#64 | 2006-02-28Methods and systems for determining overlay and flatness of a specimen
#65 | 2006-02-02Test structures and methods for monitoring or controlling a semiconductor fabrication process
#66 | 2006-01-17Methods and systems for lithography process control
#67 | 2005-09-27Methods and systems for determining a thickness of a structure on a specimen and at least one additional property of the specimen
#68 | 2005-09-22Focus masking structures, focus patterns and measurements thereof
#69 | 2005-09-20Methods and systems for determining a characteristic of a layer formed on a specimen by a deposition process
#70 | 2005-07-19Methods and systems for determining a critical dimension, a presence of defects, and a thin film characteristic of a specimen
#71 | 2005-07-12Methods and systems for determining a property of a specimen prior to, during, or subsequent to an etch process
#72 | 2005-07-12Methods and systems for determining flatness, a presence of defects, and a thin film characteristic of a specimen
#73 | 2005-05-10Methods and systems for determining a critical dimension and overlay of a specimen
#74 | 2005-05-10Methods and systems for determining an implant characteristic and a presence of defects on a specimen
#75 | 2005-04-26Focus masking structures, focus patterns and measurements thereof
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