121249 ⎘
Liquid-phase epitaxial-layer growth
Sub-classes:ORGANIC SEMICONDUCTOR FILM AND PREPARATION METHOD THEREOF
#2ELECTRO-FORMED METAL FOILS
#3SINGLE-CRYSTAL DIAMOND AND METHOD OF MANUFACTURING THE SAME
#4SINGLE-CRYSTAL DIAMOND AND METHOD OF MANUFACTURING THE SAME
#5SINGLE-CRYSTAL DIAMOND AND METHOD OF MANUFACTURING THE SAME
#6CHIRAL ORGANIC OPTOELECTRONIC MOLECULES WITH TUNABLE REFRACTIVE INDEX FOR IMPROVED CONTROL OF CIRCULARLY POLARIZED LIGHT PROPAGATION IN OPTICAL DEVICES
#7Electro-formed metal foils
#8Single-crystal perovskite solid solutions with indifferent points for epitaxial growth of single crystals
#9FARADAY ROTATOR, OPTICAL ISOLATOR, AND METHOD OF MANUFACTURING FARADAY ROTATOR
#10Solution deposition method for forming metal oxide or metal hydroxide layer
#11Single-crystal perovskite solid solutions with indifferent points for epitaxial growth of single crystals
#12Method for producing Group III nitride semiconductor, seed substrate and Group III nitride semiconductor crystal
#13Synthesis and processing of pure and NV nanodiamonds and other nanostructures for quantum computing and magnetic sensing applications
#14SYNTHESIS AND PROCESSING OF PURE AND NV NANODIAMONDS AND OTHER NANOSTRUCTURES FOR QUANTUM COMPUTING AND MAGNETIC SENSING APPLICATIONS
#15Solution deposition method for forming metal oxide or metal hydroxide layer
#16Methods of growing heteroepitaxial single crystal or large grained semiconductor films and devices thereon
#17Method for making epitaxial structure
#18Methods and mask structures for substantially defect-free epitaxial growth
#19Additive for preparing suede on monocrystalline silicon chip and use method thereof
#20Solution deposition method for forming metal oxide or metal hydroxide layer
#21Methods of growing heteroepitaxial single crystal or large grained semiconductor films and devices thereon
#22Method of forming metal film
#23Coupling between nanostructures and optical fibers
#24Magnetic material including α″-Fe(NZ)or a mixture of α″-FeZand α″-FeN, where Z includes at least one of C, B, or O
#25FABRICATION AND/OR APPLICATION OF ZINC OXIDE CRYSTALS WITH INTERNAL (INTRA-CRYSTALLINE) POROSITY
#26Depression filling method and processing apparatus
#27Method and device for fabricating a layer in semiconductor material
#28Self-assemblable polymer and methods for use in lithography
#29Heat exchangers in sapphire processing
#30Pattern forming method
#31Synthesis and applications of graphene based nanomaterials
#32Method for crystal growth of a metal-nonmetal compound using a metallophobic-metallophilic surfactant and a thin metal wetting layer
#33Unit for liquid phase epitaxial growth of monocrystalline silicon carbide, and method for liquid phase epitaxial growth of monocrystalline silicon carbide
#34Method for epitaxial growth of monocrystalline silicon carbide using a feed material including a surface layer containing a polycrystalline silicon carbide with a 3C crystal polymorph
#35Method for making an epitaxial structure with carbon nanotube layer
#36Method for making epitaxial structure
#37Methods using mask structures for substantially defect-free epitaxial growth
#38Method of growing GaN whiskers from a gallium-containing solvent at low pressure and low temperature
#39METHOD OF FORMING EPITAXIAL ZINC OXIDE FILMS
#40Production method of n-type SiC single crystal, n-type SiC single crystal obtained thereby and application of same
#41III-nitride crystal substrate and III-nitride semiconductor device
#42Electroluminescent device for the production of ultra-violet light
#43GaN whiskers and methods of growing them from solution
#44AlxGa(1-x)As Substrate, Epitaxial Wafer for Infrared LEDs, Infrared LED, Method of Manufacturing AlxGa(1-x)As Substrate, Method of Manufacturing Epitaxial Wafer for Infrared LEDs, and Method of Manufacturing Infrared LEDs
#45AlxGa(1-x)As Substrate, Epitaxial Wafer for Infrared LEDs, Infrared LED, Method of Manufacturing AlxGa(1-x)As Substrate, Method of Manufacturing Epitaxial Wafer for Infrared LEDs, and Method of Manufacturing Infrared LEDs
#46AlxGa(1-x)As Substrate, Epitaxial Wafer for Infrared LEDs, Infrared LED, Method of Manufacturing AlxGa(1-x)As Substrate, Method of Manufacturing Epitaxial Wafer for Infrared LEDs, and Method of Manufacturing Infrared LEDs
#47Group III nitride epitaxial substrate for semiconductor device, semiconductor device, and process for producing group III nitride epitaxial substrate for semiconductor device
#48Magnetic garnet single crystal and optical element using same as well as method of producing single crystal
#49Method for growing p-type SiC semiconductor single crystal and p-type SiC semiconductor single crystal
#50Epitaxial substrate for semiconductor device, semiconductor device, and method of manufacturing epitaxial substrate for semiconductor device
#51Method for growing silicon carbide single crystal
#52III-nitride crystal manufacturing method, III-nitride crystal substrate, and III-nitride semiconductor device
#53Method for producing silicon carbide single crystal
#54Magnetic garnet single crystal and optical element using same as well as method of producing single crystal
#55Method of manufacturing group III nitride substrate and semiconductor device
#56Process for producing single crystal of gallium-containing nitride
#57Minimizing degradation of SiC bipolar semiconductor devices
#58Thin plate manufacturing method and thin plate manufacturing apparatus
#59Method of heat treatment and heat treatment apparatus
#60Smooth surface liquid phase epitaxial germanium
#61High-density germanium-on-insulator photodiode array
#62Tetravalent chromium doped laser materials and NIR tunable lasers
#63Thin sheet production method and thin sheet production device
#64Minimizing degradation of SiC bipolar semiconductor devices
#65Minimizing degradation of SiC bipolar semiconductor devices
#66Method of manufacturing potassium niobate single crystal thin film, surface acoustic wave element, frequency filter, frequency oscillator, electronic circuit, and electronic apparatus
#67Method for forming a Si film, Si film and solar battery