H01J2237/31706 - CPC Classification Index

ClassID:

206612 ⎘

H01J2237/31706 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Ion implantation characterised by the area treated

Sub-classes:

H01J2237/31708 » unpatterned 9
H01J2237/3171 » patterned 22

Recent Application in this class:

20250132126

2025-04-24

METHOD FOR DOPING TWO-DIMENSIONAL MATERIAL BASED ON CLUSTER ION IMPLANTATION

20220189736

2022-06-16

Ion implantation apparatus

20210305011

2021-09-30

In situ angle measurement using channeling

20150378261

2015-12-31

Methods and apparatus for nanofabrication using a pliable membrane mask

20120318993

2012-12-20

High spatial resolution particle detectors

20120252194

2012-10-04

Ion implantation method and ion implantation apparatus

20120104285

2012-05-03

Ion implantation method and ion implantation apparatus

20110215263

2011-09-08

Ion implantation method and ion implantation apparatus

20110140005

2011-06-16

Ion implanting system

#10

20100155898

2010-06-24

Method for enhancing tensile stress and source/drain activation using Si:C

#11

20090321625

2009-12-31

Ion implanter having combined hybrid and double mechanical scan architecture

#12

20090230329

2009-09-17

Ion implantation method

#13

20090032726

2009-02-05

Ion implanter having combined hybrid and double mechanical scan architecture

#14

20090032725

2009-02-05

APPARATUS AND METHODS FOR TREATING A WORKPIECE USING A GAS CLUSTER ION BEAM

#15

20060208204

2006-09-21

Technique for ion beam angle spread control for advanced applications