FEATURE PATTERNING USING PITCH RELAXATION AND DIRECTIONAL END-PUSHING WITH ION BOMBARDMENT

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN THE PRODUCTION OF WAFERS

Energy filter element for ion implantation systems for the use in the production of wafers

Feature patterning using pitch relaxation and directional end-pushing with ion bombardment

Feature patterning using pitch relaxation and directional end-pushing with ion bombardment

Energy filter element for ion implantation systems for the use in the production of wafers

Ion implanter irradiating ion mean onto wafer and ion implantation method using the same

Energy filter element for ion implantation systems for the use in the production of wafers

Energy filter element for ion implantation systems for the use in the production of wafers

Method for generating parameter pattern, ion implantation method and feed forward semiconductor manufacturing method

ANISOTROPIC SURFACE ENERGY MODULATION BY ION IMPLANTATION

Ion implantation apparatus and ion implantation method

Method of manufacturing magnetic recording medium, and magnetic recording medium

METHOD AND IMPLANTER FOR IMPLANTING A WORKPIECE

Ion implantation through laser fields

Method for treating non-planar structures using gas cluster ion beam processing

Manufacturing system for semiconductor device capable of controlling variation in electrical property of element in wafer surface and method for manufacturing the semiconductor device

Ion source, ion implantation apparatus, and ion implantation method

Non-uniform ion implantation

High brightness—multiple beamlets source for patterned X-ray production

Nonuniform ion implantation apparatus and method using a wide beam

Methods and apparatus for enabling multiple process steps on a single substrate

Device and method of positionally accurate implantation of individual particles in a substrate surface