Patents-Review.com
ClassID:

206616 ⎘

H01J2237/31713 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Ion implantation characterised by the area treated patterned Focused ion beam

Recent Application in this class:
#1
20190267209
2019-08-29

Method and device for implanting ions in wafers

 #2
20190198292
2019-06-27

Ion beam quality control using a movable mass resolving device

 #3
20180261427
2018-09-13

Microstructure manufacturing method and microstructure manufacturing apparatus

 #4
20150380204
2015-12-31

Imaging and processing for plasma ion source

 #5
20150348752
2015-12-03

Ion implantation to alter etch rate

 #6
20140147998
2014-05-29

Ion implantation at high temperature surface equilibrium conditions

 #7
20140076717
2014-03-20

Charged particle beam device and sample production method

 #8
20130320229
2013-12-05

Imaging and processing for plasma ion source

 #9
20120326028
2012-12-27

Charged particle beam apparatus, and sample processing and observation method

 #10
20120286149
2012-11-15

METHOD AND APPARATUS FOR PROVIDING BEAMS OF NANODROPLETS FOR HIGH SPUTTERING RATE OF INERT MATERIALS

 #11
20120112323
2012-05-10

Apparatus and method for controlled particle beam manufacturing

 #12
20120112090
2012-05-10

Charged particle source with integrated electrostatic energy filter

 #13
20110309553
2011-12-22

System and method for precision fabrication of micro- and nano-devices and structures

 #14
20110290639
2011-12-01

METHOD AND APPARATUS FOR PROVIDING BEAMS OF NANODROPLETS FOR HIGH SPUTTERING RATE OF INERT MATERIALS

 #15
20100176297
2010-07-15

Dual beam apparatus with tilting sample stage

 #16
20100138028
2010-06-03

Graphical automated machine control and metrology

 #17
20100098922
2010-04-22

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

 #18
20100032302
2010-02-11

Method to direct pattern metals on a substrate

 #19
20090134327
2009-05-28

Defect recognizing method, defect observing method, and charged particle beam apparatus

 #20
20090020698
2009-01-22

CHARGED PARTICLE BEAM APPARATUS, AND SAMPLE PROCESSING AND OBSERVATION METHOD

 #21
20080097621
2008-04-24

Graphical automated machine control and metrology

 #22
20080073582
2008-03-27

Ion beam processing apparatus

 #23
20070284695
2007-12-13

Apparatus and method for controlled particle beam manufacturing

 #24
20070284538
2007-12-13

Apparatus and method for controlled particle beam manufacturing

 #25
20070284537
2007-12-13

Apparatus and method for controlled particle beam manufacturing

 #26
20070284527
2007-12-13

Apparatus and method for controlled particle beam manufacturing

 #27
20070278428
2007-12-06

Apparatus and method for controlled particle beam manufacturing

 #28
20070278419
2007-12-06

Apparatus and method for controlled particle beam manufacturing

 #29
20070278418
2007-12-06

Apparatus and method for controlled particle beam manufacturing

 #30
20070045534
2007-03-01

Apparatus and method for controlled particle beam manufacturing

 #31
20050188309
2005-08-25

Graphical automated machine control and metrology

 #32
20050061997
2005-03-24

Ion beam slit extraction with mass separation