H01J2237/31781 - CPC Classification Index

ClassID:

206656 ⎘

H01J2237/31781 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography by projection from patterned cold cathode

Sub-classes:

H01J2237/31783 » M-I-M cathode 1
H01J2237/31784 » Semiconductor cathode 1
H01J2237/31786 » Field-emitting cathode 8

Recent Application in this class:

20200266033

2020-08-20

Charged particle beam lithography apparatus and charged particle beam pattern writing method

20190198293

2019-06-27

Charged particle beam lithography apparatus and charged particle beam pattern writing method

20150371810

2015-12-24

Individually switched field emission arrays

20060151712

2006-07-13

Focusing apparatus and lithography system using the same

14542105

2017-07-25

Apparatus and methods for electron beam lithography using array cathode