Y10S438/914 - CPC Classification Index

ClassID:

242003 ⎘

Y10S438/914 - CPC Classification

Classification description:

Semiconductor device manufacturing: process Doping

Sub-classes:

Y10S438/915 » Amphoteric doping 0
Y10S438/916 » Autodoping control or utilization 3
Y10S438/917 » Deep level dopants, e.g. gold, chromium, iron or nickel 16
Y10S438/918 » Special or nonstandard dopant 18
Y10S438/919 » Compensation doping 27
Y10S438/92 » Controlling diffusion profile by oxidation 6
Y10S438/921 » Nonselective diffusion 0
Y10S438/922 » Diffusion along grain boundaries 6
Y10S438/923 » Diffusion through a layer 13
Y10S438/924 » To facilitate selective etching 34
Y10S438/925 » Fluid growth doping control, e.g. delta doping 10

Recent Application in this class:

20180182636

2018-06-28

Etch rate modulation through ion implantation

20170178914

2017-06-22

Etch rate modulation through ion implantation

20150137316

2015-05-21

Semiconductor device including a resistor and method for the formation thereof

20140264342

2014-09-18

Semiconductor device including a resistor and method for the formation thereof

20140144379

2014-05-29

Systems and methods for plasma doping microfeature workpieces

20120214260

2012-08-23

Semiconductor surface modification

20110070705

2011-03-24

Manufacturing method of a NOR flash memory with phosphorous and arsenic ion implantations

20110003475

2011-01-06

Semiconductor device and method for manufacturing the same

20100295607

2010-11-25

SYSTEM AND METHOD TO REDUCE NOISE IN A SUBSTRATE

#10

20100270635

2010-10-28

Semiconductor surface modification

#11

20100197049

2010-08-05

Doping apparatus, doping method, and method for fabricating thin film transistor

#12

20100190355

2010-07-29

Substrate processing apparatus and manufacturing method of semiconductor device

#13

20090236598

2009-09-24

ZnO layer and semiconductor light emitting device

#14

20090200670

2009-08-13

Semiconductor device and method for manufacturing the same

#15

20090163040

2009-06-25

Substrate processing apparatus and manufacturing method of semiconductor device

#16

20080042205

2008-02-21

Low-cost high-performance planar back-gate CMOS

#17

20070224711

2007-09-27

Doping apparatus, doping method, and method for fabricating thin film transistor

#18

20070048453

2007-03-01

Systems and methods for plasma doping microfeature workpieces

#19

20070029620

2007-02-08

Low-cost high-performance planar back-gate CMOS

#20

20060186354

2006-08-24

Method for thermal processing with a RTP process using temperature spaces in radiation equilibrium

#21

20060073685

2006-04-06

Method for implanting dopants within a substrate by tilting the substrate relative to the implant source

#22

20060024928

2006-02-02

Methods for controlling dopant concentration and activation in semiconductor structures

#23

20050275066

2005-12-15

System and method to reduce noise in a substrate

#24

20050266606

2005-12-01

Method of producing an N-type diamond with high electrical conductivity

#25

20050167001

2005-08-04

Process for producing highly doped semiconductor wafers, and dislocation-free highly doped semiconductor wafers

#26

20050124098

2005-06-09

Method of reducing noise disturbing a signal in an electronic device

#27

20050095805

2005-05-05

System and method to reduce noise in a substrate

#28

20050032341

2005-02-10

Doping method and method for fabricating thin film transistor